Bhanu Kiran Pothineni, Chantal Theile-Rasche, Hendrik Müller, Guido Grundmeier, Teresa de los Arcos, Adrian Keller
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引用次数: 0
Abstract
DNA origami triangles prefer smooth SiOxsurfaces with high oxide density. On SiOx films grown by physical or chemical vapor deposition, DNA origami adsorption is strongly suppressed because of their low density and high roughness, respectively. In contrast, DNA origami triangles form ordered lattices upon adsorption on thermally grown and native SiOx films. More information can be found in the Research Article by A. Keller and co-workers (DOI: 10.1002/chem.202404108).
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