Oxygen Vacancies Enhance SERS Performance of Tungsten-Doped Vanadium Dioxide Nanoparticles

IF 6.4 3区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Advanced Materials Technologies Pub Date : 2024-12-14 DOI:10.1002/admt.202401304
Jiran Liang, Lanxiang Zhang, Shuai Wang, Yong Yu, Dangyuan Lei
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Abstract

Surface-enhanced Raman spectroscopy (SERS) is a powerful spectroscopic identification technique for analyzing chemical and biological analytes. Semiconductors are important materials that can expand the scope of SERS applications. However, the low SERS enhancements limit the application of semiconductor substrates. In this work, a new defect engineering approach is used, i.e., combining two types of defects, to enhance SERS performance by preparing of oxygen-vacancy-tunable W-doped VO2 substrate. In this design, two types of defects effect in synergy to improve the SERS performance of rhodamine 6G (R6G). The oxygen vacancy concentration in W-doped VO2 is adjusted through thermal annealing. This substrate achieves a detection limit of 1 × 10−7 m for R6G and an enhancement factor (EF) of 1.39 × 106, comparable to noble metals. XPS and DFT analysis reveal that SERS enhancement can be attributed to the high density of electronic states associated with W-doping and oxygen vacancies. Additionally, W-doping increases the free electron concentration in the oxygen-deficient W-VO2, which enhances the charge transfer (CT) between the substrate and R6G, leading to significant amplification of Raman signal. This work provides a defect-engineering approach based on the synergistic effect of oxygen vacancies and tungsten doping for enhancing the SERS performance of metal oxide semiconductor-based substrates.

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氧空位增强了钨掺杂二氧化钒纳米粒子的SERS性能
表面增强拉曼光谱(SERS)是分析化学和生物分析物的一种强大的光谱识别技术。半导体是可以扩大SERS应用范围的重要材料。然而,低SERS增强限制了半导体衬底的应用。在这项工作中,采用了一种新的缺陷工程方法,即结合两种类型的缺陷,通过制备氧空位可调w掺杂VO2衬底来增强SERS性能。在本设计中,两类缺陷协同作用,提高罗丹明6G (R6G)的SERS性能。通过热退火调节w掺杂VO2中的氧空位浓度。该衬底对R6G的检测限为1 × 10−7 m,增强因子(EF)为1.39 × 106,与贵金属相当。XPS和DFT分析表明,SERS增强可归因于与w掺杂和氧空位相关的高密度电子态。此外,w掺杂增加了贫氧W-VO2中的自由电子浓度,增强了衬底与R6G之间的电荷转移(CT),导致拉曼信号显著放大。这项工作提供了一种基于氧空位和钨掺杂协同效应的缺陷工程方法,以提高金属氧化物半导体基衬底的SERS性能。
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来源期刊
Advanced Materials Technologies
Advanced Materials Technologies Materials Science-General Materials Science
CiteScore
10.20
自引率
4.40%
发文量
566
期刊介绍: Advanced Materials Technologies Advanced Materials Technologies is the new home for all technology-related materials applications research, with particular focus on advanced device design, fabrication and integration, as well as new technologies based on novel materials. It bridges the gap between fundamental laboratory research and industry.
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