Analytic Synthesis of Focused Fields of Low Sidelobe Levels Inside Metallic Cavity by 3-D Eigenmodes Mapping

IF 4.8 2区 计算机科学 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Antennas and Wireless Propagation Letters Pub Date : 2024-11-27 DOI:10.1109/LAWP.2024.3507156
Xin Ma;Chongyao Ning;Deshuang Zhao;Bing-Zhong Wang
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Abstract

Flexibly generating the desired focused electric fields within a target area inside a metallic cavity is a challenging problem relevant in many applications. This letter proposes an analytical method for synthesizing the focused fields based on the eigenmode mapping (EMM) from 2-D to 3-D. Initially, the desired focused fields within the target area are expressed by the superposition of 2-D eigenmodes. These 2-D eigenmodes are then mapped onto 3-D eigenmodes, which can be excited at the same frequency. Subsequently, the antenna array excites the synthesized field, with the excitation coefficients determined by the excitation matrix and the 3-D eigenmode expansion vector of the desired electric field. Owing to its analytical properties, this method rapidly calculates the excitation coefficients, enabling real-time control of the focused field generation inside the cavity. Furthermore, the proposed method not only prevents the excitation of a limited number of 3-D eigenmodes and unwanted higher-order 3-D eigenmodes, but also takes into account the field distribution outside the focal spots, effectively reducing sidelobe levels. Full-wave simulations demonstrate that the proposed method successfully generated two focused fields with sidelobe levels 6 dB lower than the traditional time reversal (TR) method.
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基于三维特征模映射的金属腔内低副瓣聚焦场的解析综合
在金属腔内的目标区域内灵活地产生所需的聚焦电场是一个具有挑战性的问题,与许多应用相关。本文提出了一种基于特征模映射(EMM)的二维到三维聚焦场合成的分析方法。最初,目标区域内所需的聚焦场由二维特征模的叠加表示。然后将这些二维特征模态映射到三维特征模态上,三维特征模态可以以相同的频率被激发。随后,天线阵列对合成场进行激励,激励系数由激励矩阵和期望电场的三维特征模展开向量确定。由于其解析特性,该方法可以快速计算激发系数,从而实现对腔内聚焦场产生的实时控制。此外,该方法不仅防止了有限数量的三维特征模和不需要的高阶三维特征模的激发,而且考虑了焦斑外的场分布,有效地降低了副瓣电平。全波仿真结果表明,该方法比传统的时间反转(TR)方法成功地产生了两个副瓣电平低6 dB的聚焦场。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
8.00
自引率
9.50%
发文量
529
审稿时长
1.0 months
期刊介绍: IEEE Antennas and Wireless Propagation Letters (AWP Letters) is devoted to the rapid electronic publication of short manuscripts in the technical areas of Antennas and Wireless Propagation. These are areas of competence for the IEEE Antennas and Propagation Society (AP-S). AWPL aims to be one of the "fastest" journals among IEEE publications. This means that for papers that are eventually accepted, it is intended that an author may expect his or her paper to appear in IEEE Xplore, on average, around two months after submission.
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