The Static Limit in MeV Secondary Ion Mass Spectrometry.

IF 2.7 2区 化学 Q2 BIOCHEMICAL RESEARCH METHODS Journal of the American Society for Mass Spectrometry Pub Date : 2025-04-02 Epub Date: 2025-03-07 DOI:10.1021/jasms.5c00024
Mirjana Sepahyar Lorentzen, Boštjan Jenčič, Primož Vavpetič, Primož Pelicon
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Abstract

Static limit in secondary ion mass spectrometry (SIMS) is defined as a threshold beam fluence, where secondary ions are desorbed only from the virgin surface. For the common SIMS technique, the static SIMS limit is set to approximately 1012 ions/cm2. Within the present paper, we investigated the applicability of the static limit for a mass spectrometry imaging technique known as MeV-SIMS, where the target surface is bombarded by primary ions within the MeV energy range domain. Here, desorption of secondary ions relies mainly on electronic excitations instead of collision cascades, as is the case for the lower energy primary ion beams. We have measured the disappearance cross sections of several organic targets for three different chlorine primary ion beam energies. Results show how the disappearance cross section depends on the primary ion beam energy. Generally, the static SIMS regime applies for a range of primary ion beam fluences similar to that for the common SIMS technique; however, the dependence of the disappearance cross section within the lower MeV energy domain (up to 10 MeV) exhibits somewhat unexpected characteristics. Further, we thoroughly investigated the dynamics of the secondary ion mass spectra after prolonged primary ion bombardment. Secondary ion yields of various peaks were monitored during analysis, and the corresponding data can be used to identify specific peaks and also to determine fragmentation patterns of analyzed organic molecules.

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MeV次离子质谱法的静态极限。
次级离子质谱法(SIMS)中的静态极限被定义为阈值束流,其中次级离子仅从原始表面解吸。对于普通的SIMS技术,静态SIMS限制设置为大约1012离子/平方厘米。在本文中,我们研究了被称为MeV- sims的质谱成像技术的静态极限的适用性,其中目标表面被MeV能量范围内的初级离子轰击。在这里,二次离子的解吸主要依赖于电子激发,而不是碰撞级联,就像能量较低的一次离子束一样。我们测量了三种不同氯一次离子束能量下几个有机靶的消失截面。结果表明,消失截面与主离子束能量有关。一般来说,静态SIMS制度适用于与普通SIMS技术类似的一次离子束影响范围;然而,在较低MeV能量域(高达10 MeV)内,消失截面的依赖性表现出一些意想不到的特征。此外,我们还深入研究了长时间主离子轰击后二次离子质谱的动力学。在分析过程中监测了各峰的二次离子产率,相应的数据可以用来识别特定的峰,也可以用来确定被分析的有机分子的破碎模式。
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来源期刊
CiteScore
5.50
自引率
9.40%
发文量
257
审稿时长
1 months
期刊介绍: The Journal of the American Society for Mass Spectrometry presents research papers covering all aspects of mass spectrometry, incorporating coverage of fields of scientific inquiry in which mass spectrometry can play a role. Comprehensive in scope, the journal publishes papers on both fundamentals and applications of mass spectrometry. Fundamental subjects include instrumentation principles, design, and demonstration, structures and chemical properties of gas-phase ions, studies of thermodynamic properties, ion spectroscopy, chemical kinetics, mechanisms of ionization, theories of ion fragmentation, cluster ions, and potential energy surfaces. In addition to full papers, the journal offers Communications, Application Notes, and Accounts and Perspectives
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