Effect of Deposition and Annealing Temperatures on the Phase Composition of TiO2 Films Obtained by Atomic Layer Deposition from Titanium Tetrachloride and Water

Abstract

Titanium dioxide TiO₂ films are obtained from titanium tetrachloride and water by atomic layer deposition. A change in the phase composition of the films is found when the deposition and annealing temperatures are varied. At a deposition temperature of 150 °C amorphous films are formed; at 200-400 °C films containing the anatase phase are formed; a mixture of anatase and rutile phases is formed in high-temperature films (deposition temperatures of 450 °C and 500 °C). Annealing of high-temperature films at 400 °C and 500 °C increases the relative intensity of rutile reflections. The film morphology is analyzed by scanning electron and atomic force microscopy techniques. As the deposition temperature increases, grains enlarge on the film surface.