A Comprehensive Review on Light Field Occlusion Removal: Trends, Challenges, and Future Directions

IF 3.6 3区 计算机科学 Q2 COMPUTER SCIENCE, INFORMATION SYSTEMS IEEE Access Pub Date : 2025-03-05 DOI:10.1109/ACCESS.2025.3548133
Mostafa Farouk Senussi;Mahmoud Abdalla;Mahmoud Salaheldin Kasem;Mohamed Mahmoud;Bilel Yagoub;Hyun-Soo Kang
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Abstract

Overcoming occlusions in light field (LF) imaging is a challenging yet complex task crucial for scene understanding, image quality enhancement, and restoring visual details in obstructed scenes. This review examines contemporary occlusion removal methods, spanning from classical techniques to advanced deep learning approaches that leverage LF data’s spatial and angular dimensions. We categorize these methods into two domains: (1) single-view inpainting methods often adapted for LF contexts, and (2) specialized LF occlusion removal techniques that exploit multi-view data. The review explores how these methods mitigate occlusion artifacts and also investigates LF acquisition technologies, representations, and the role of loss functions in optimizing model performance. A discussion of publicly available datasets and performance evaluation metrics addresses the challenges of handling large occlusions. The review concludes with future research directions, emphasizing hybrid approaches, refined loss functions, and scalable solutions for LF occlusion removal.
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光场遮挡去除:趋势、挑战和未来方向综述
克服光场(LF)成像中的遮挡是一项具有挑战性且复杂的任务,对于场景理解、图像质量增强和恢复受阻场景中的视觉细节至关重要。本文综述了当代的遮挡去除方法,从经典技术到利用LF数据的空间和角度维度的高级深度学习方法。我们将这些方法分为两个领域:(1)通常适用于LF上下文的单视图绘制方法,以及(2)利用多视图数据的专用LF遮挡去除技术。本文探讨了这些方法如何减轻遮挡伪影,并研究了低频采集技术、表征以及损失函数在优化模型性能中的作用。对公开可用数据集和性能评估指标的讨论解决了处理大型遮挡的挑战。本文总结了未来的研究方向,强调混合方法、精细损失函数和可扩展的LF闭塞去除方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Access
IEEE Access COMPUTER SCIENCE, INFORMATION SYSTEMSENGIN-ENGINEERING, ELECTRICAL & ELECTRONIC
CiteScore
9.80
自引率
7.70%
发文量
6673
审稿时长
6 weeks
期刊介绍: IEEE Access® is a multidisciplinary, open access (OA), applications-oriented, all-electronic archival journal that continuously presents the results of original research or development across all of IEEE''s fields of interest. IEEE Access will publish articles that are of high interest to readers, original, technically correct, and clearly presented. Supported by author publication charges (APC), its hallmarks are a rapid peer review and publication process with open access to all readers. Unlike IEEE''s traditional Transactions or Journals, reviews are "binary", in that reviewers will either Accept or Reject an article in the form it is submitted in order to achieve rapid turnaround. Especially encouraged are submissions on: Multidisciplinary topics, or applications-oriented articles and negative results that do not fit within the scope of IEEE''s traditional journals. Practical articles discussing new experiments or measurement techniques, interesting solutions to engineering. Development of new or improved fabrication or manufacturing techniques. Reviews or survey articles of new or evolving fields oriented to assist others in understanding the new area.
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