Resonant defect states of the SnO2:Ta transparent conductive oxide revealed by excitation wavelength-dependent Raman spectroscopy and hybrid functional DFT calculations†

IF 9.5 2区 材料科学 Q1 CHEMISTRY, PHYSICAL Journal of Materials Chemistry A Pub Date : 2025-04-01 DOI:10.1039/D4TA08693G
Matthias Krause, Carlos Romero-Muñiz, Oleksandr Selyshchev, Dietrich R. T. Zahn and Ramon Escobar-Galindo
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Abstract

Excitation wavelength-dependent Raman spectroscopy, optical spectroscopy, and density functional theory (DFT) calculations with hybrid functionals were used to analyse the electronic structure of defects in SnO2:Ta (1.25 at% Ta) transparent conductive oxide thin films. Based on the Raman excitation profiles of the characteristic D1 and D2 defect modes of two tin vacancy VSn-type defects and one oxygen interstitial Oi-type defect, we derived the corresponding defect-induced electronic transitions of the involved defect states. DFT calculations revealed additional density-of-states for the three point defects at the top of the valence band (VB) in comparison to defect-free SnO2 and SnO2:Ta. The largest distortion of the VB electronic structure was caused by the VSn-type defect with the farthest possible distance from the Ta dopant in the studied 96-atom supercell, and the smallest distortion was caused by the Oi-type defect. Accordingly, the amount of VB splitting showed a reverse order to the electronic transition energies. From the projected defect-density-of-states, we found a delocalized nature of the VSn-type defects and a localized nature of the Oi-type defect, accounting for the different degrees of distortion of the SnO2:Ta electronic structure. Based on these complementary experimental and theoretical results, the electronic structure of point defects in the SnO2:Ta transparent conductive oxide was elucidated in detail. Thus, the proposed approach has great potential to resolve the ongoing controversy about point defects in SnO2.

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利用激发波长相关拉曼光谱和混合泛函DFT计算揭示了透明导电氧化物SnO2:Ta的共振缺陷态
利用激发波长相关拉曼光谱、光谱学和混合泛函密度泛函理论(DFT)计算分析了透明导电氧化物SnO2:Ta (1.25 at)中缺陷的电子结构。(1)薄膜。基于两个锡空位VSn-型缺陷和一个氧间隙i型缺陷的特征D1和D2缺陷模式的拉曼激发谱,我们推导了相应缺陷态的缺陷诱导电子跃迁。DFT计算结果显示,与无缺陷的SnO2和SnO2:Ta相比,在价带(VB)顶部的三点缺陷的态密度增加。在96原子超级单体中,距离Ta掺杂最远的vsn型缺陷引起VB电子结构的最大畸变,而由i型缺陷引起的畸变最小。因此,VB的分裂量与电子跃迁能呈相反的顺序。从预测的缺陷态密度中,我们发现VSn-和i型缺陷分别具有非局域性和局域性,这说明了SnO2:Ta电子结构的不同程度的扭曲。基于这些互补的实验和理论结果,对透明导电氧化物SnO2:Ta中点缺陷的电子结构进行了详细的阐述。所提出的方法有很大的潜力来解决目前关于SnO2点缺陷的争议。
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来源期刊
Journal of Materials Chemistry A
Journal of Materials Chemistry A CHEMISTRY, PHYSICAL-ENERGY & FUELS
CiteScore
19.50
自引率
5.00%
发文量
1892
审稿时长
1.5 months
期刊介绍: The Journal of Materials Chemistry A, B & C covers a wide range of high-quality studies in the field of materials chemistry, with each section focusing on specific applications of the materials studied. Journal of Materials Chemistry A emphasizes applications in energy and sustainability, including topics such as artificial photosynthesis, batteries, and fuel cells. Journal of Materials Chemistry B focuses on applications in biology and medicine, while Journal of Materials Chemistry C covers applications in optical, magnetic, and electronic devices. Example topic areas within the scope of Journal of Materials Chemistry A include catalysis, green/sustainable materials, sensors, and water treatment, among others.
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