Disilane synthesis by dielectric barrier discharge of gas-phase silane: Experimental test and computational simulation

Abstract

Disilane synthesis has garnered significant interest due to its potential applications in fields such as materials science and semiconductor technology. Dielectric barrier discharge of silane offers a promising method for the industrial production of disilane. Herein, a newly designed experimental device has been applied to facilitate the direct synthesis of disilane through silane plasma reactions under atmospheric pressure. The effects of operational parameters, including inert gas, gas flow rate, composition, and medium type, on the reaction have been systematically investigated. After optimization, it is found that the number density ratio of disilane to silane could reach 10%. To elucidate the underlying reaction mechanism, a silane plasma discharge model is developed using COMSOL Multiphysics software. The simulation results of gas-phase silane discharge reactions are proved by the experimental tests. These findings would provide insights and fundamental to the development of green, safe, and efficient processes for disilane synthesis via silane discharge.