Doping in Efficient Polycrystalline CdSeTe Solar Cells via AsCl3 Vapor Annealing

IF 5.5 3区 材料科学 Q2 CHEMISTRY, PHYSICAL ACS Applied Energy Materials Pub Date : 2025-03-24 DOI:10.1021/acsaem.4c03173
Xiaomeng Duan, Deng-Bing Li, Sabin Neupane, Rasha Awni, Yizhao Wang, Lorelle M. Mansfield, Dingyuan Lu, James Becker, Randy J. Ellingson, Michael J. Heben, Gang Xiong, Yanfa Yan and Feng Yan*, 
{"title":"Doping in Efficient Polycrystalline CdSeTe Solar Cells via AsCl3 Vapor Annealing","authors":"Xiaomeng Duan,&nbsp;Deng-Bing Li,&nbsp;Sabin Neupane,&nbsp;Rasha Awni,&nbsp;Yizhao Wang,&nbsp;Lorelle M. Mansfield,&nbsp;Dingyuan Lu,&nbsp;James Becker,&nbsp;Randy J. Ellingson,&nbsp;Michael J. Heben,&nbsp;Gang Xiong,&nbsp;Yanfa Yan and Feng Yan*,&nbsp;","doi":"10.1021/acsaem.4c03173","DOIUrl":null,"url":null,"abstract":"<p >Doping in cadmium telluride (CdTe) thin-film solar cells is a critical step in producing highly efficient CdTe solar modules. To date, copper (Cu) ex-situ diffusion doping and group V in situ doping (such as arsenic, As) have been effectively used in manufacturing CdTe solar modules. However, Cu doping is prone to rapid degradation, whereas the low activation ratio of the dopants constrains group V in situ doping. Recently, ex-situ group V doping has been developed, showing an improved doping activation ratio through a solution process. In this study, we developed a vapor-based AsCl<sub>3</sub> doping method for diffusion doping of polycrystalline CdSeTe devices. AsCl<sub>3</sub> vapor annealing can promote the diffusion of As into the bulk CdSeTe through a surface chemical reaction between CdTe and AsCl<sub>3</sub>. This approach has led to a long carrier lifetime of over 72 ns, <i>V</i><sub>oc</sub> of 850 mV, and power conversion efficiency of ∼18% with Au metal electrodes. The vapor-based ex situ group V doping approach offers an effective means to perform group V diffusion doping into the CdSeTe device.</p>","PeriodicalId":4,"journal":{"name":"ACS Applied Energy Materials","volume":"8 7","pages":"4265–4271 4265–4271"},"PeriodicalIF":5.5000,"publicationDate":"2025-03-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Energy Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsaem.4c03173","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
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Abstract

Doping in cadmium telluride (CdTe) thin-film solar cells is a critical step in producing highly efficient CdTe solar modules. To date, copper (Cu) ex-situ diffusion doping and group V in situ doping (such as arsenic, As) have been effectively used in manufacturing CdTe solar modules. However, Cu doping is prone to rapid degradation, whereas the low activation ratio of the dopants constrains group V in situ doping. Recently, ex-situ group V doping has been developed, showing an improved doping activation ratio through a solution process. In this study, we developed a vapor-based AsCl3 doping method for diffusion doping of polycrystalline CdSeTe devices. AsCl3 vapor annealing can promote the diffusion of As into the bulk CdSeTe through a surface chemical reaction between CdTe and AsCl3. This approach has led to a long carrier lifetime of over 72 ns, Voc of 850 mV, and power conversion efficiency of ∼18% with Au metal electrodes. The vapor-based ex situ group V doping approach offers an effective means to perform group V diffusion doping into the CdSeTe device.

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AsCl3蒸汽退火掺杂高效多晶CdSeTe太阳能电池
碲化镉(CdTe)薄膜太阳能电池的掺杂是生产高效碲化镉太阳能模块的关键步骤。迄今为止,铜(Cu)原位扩散掺杂和 V 族原位掺杂(如砷,As)已被有效地用于制造碲化镉太阳能模块。然而,铜掺杂容易发生快速降解,而掺杂剂的低活化比则限制了 V 族原位掺杂。最近,V 族原位掺杂技术得到了发展,通过溶液工艺提高了掺杂活化率。在本研究中,我们开发了一种基于 AsCl3 汽相掺杂的方法,用于多晶碲化镉器件的扩散掺杂。AsCl3 气相退火可通过 CdTe 和 AsCl3 之间的表面化学反应促进 As 扩散到块状 CdSeTe 中。通过这种方法,金金属电极的载流子寿命超过 72 ns,Voc 为 850 mV,功率转换效率达到 18%。基于蒸气的 V 族原位掺杂方法为在碲化镉器件中进行 V 族扩散掺杂提供了一种有效手段。
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来源期刊
ACS Applied Energy Materials
ACS Applied Energy Materials Materials Science-Materials Chemistry
CiteScore
10.30
自引率
6.20%
发文量
1368
期刊介绍: ACS Applied Energy Materials is an interdisciplinary journal publishing original research covering all aspects of materials, engineering, chemistry, physics and biology relevant to energy conversion and storage. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials, engineering, physics, bioscience, and chemistry into important energy applications.
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