Tianze Wang , Zhenlin Hu , Liang He , Nan Lin , Yuxin Leng
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引用次数: 0
Abstract
We demonstrate a method for characterizing and controlling the optical depth of Sn plasma. A pre-plasma plume is generated by the pre-pulse laser and reheated by a second laser (the main pulse), generating extreme ultraviolet (EUV) emissions. The optical depth of the EUV-emitting plasma is controlled by adjusting the delay time between the pre-pulse and the main pulse. Meanwhile, the electron density of the EUV-emitting plasma is characterized by laser interferometry. The integrated electron density profile is found to be correlated to spectral purity (SP). By using a shorter pre-pulse wavelength, the EUV emissivity is increased with the increased pre-plasma density under the same optical depth. In addition, an optically thin Sn plasma is generated by the 1 μm Nd:YAG laser and a corresponding spectral purity of 18.8 % is observed. This method can be applied to balance the emissivity and spectral purity in solid-state laser-driven EUV sources for further customized applications.
期刊介绍：
Optics Communications invites original and timely contributions containing new results in various fields of optics and photonics. The journal considers theoretical and experimental research in areas ranging from the fundamental properties of light to technological applications. Topics covered include classical and quantum optics, optical physics and light-matter interactions, lasers, imaging, guided-wave optics and optical information processing. Manuscripts should offer clear evidence of novelty and significance. Papers concentrating on mathematical and computational issues, with limited connection to optics, are not suitable for publication in the Journal. Similarly, small technical advances, or papers concerned only with engineering applications or issues of materials science fall outside the journal scope.
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