The effect of ArF-excimer laser irradiation of the human enamel surface on the bond strength of orthodontic appliances.

Scanning microscopy Pub Date : 1995-06-01
U Stratmann, K Schaarschmidt, M Schürenberg, U Ehmer
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Abstract

This study investigated enamel laser conditioning as an alternative to acid etching in bracket therapy. In preliminary experiments optimal laser parameters for achieving a bond strength of 6-10 N/mm2 were defined. Enamel surface morphology was assessed and the ablation depth was measured on serial enamel sections. Thirty human molars were exposed to 193 nm ArF-excimer laser radiation (energy density: 260 mJ/cm2) by single pulse application of 23 nanoseconds. Thirty molars were etched with phosphoric acid (37%) for 60 seconds. The brackets from the treated molars and 30 untreated molars were debonded vertically for tensile bond strength measurement. Roughened enamel surfaces were attained by 450 and 900 laser pulses with a mean ablation depth of 10.13 +/- 4.84 microns. After 1-10 laser pulses, the enamel surface appeared intact. The tensile bond strength was 6.63 +/- 2.18 N/mm2 in the laser-treated group (1 pulse), 8.75 +/- 3.61 N/mm2 in the acid-etched group, and 4.61 +/- 3.15 N/mm2 in the untreated group. We conclude a laser-selective ablation of the membranous enamel pellicle. Since the irradiated area can be adapted to bracket base and the enamel surface remains morphologically intact, pulsed ArF-excimer laser treatment seems to be superior to the acid etching technique.

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准分子激光辐照人牙釉质表面对正畸矫治器粘结强度的影响。
本研究探讨牙釉质激光调理作为酸蚀牙槽治疗的替代方法。在初步实验中,确定了实现6-10 N/mm2键合强度的最佳激光参数。在连续的牙釉质切片上评估牙釉质表面形态并测量消融深度。将30颗人磨牙暴露在能量密度为260 mJ/cm2的193 nm arf准分子激光单脉冲照射下,照射时间为23纳秒。30磨牙用磷酸(37%)蚀刻60秒。将治疗磨牙的托槽与30颗未治疗磨牙的托槽垂直脱粘,进行抗拉强度测量。450和900次激光脉冲的平均烧蚀深度为10.13 +/- 4.84微米。经过1-10次激光脉冲后,牙釉质表面完好无损。激光处理组(1脉冲)抗拉键强度为6.63 +/- 2.18 N/mm2,酸蚀组为8.75 +/- 3.61 N/mm2,未处理组为4.61 +/- 3.15 N/mm2。我们总结了激光选择性消融膜质珐琅质膜。由于照射区域可以适应支架底座,并且牙釉质表面形态保持完整,因此脉冲arf准分子激光治疗似乎优于酸蚀刻技术。
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