Bulk single crystals of β-Ga2O3 and Ga-based spinels as ultra-wide bandgap transparent semiconducting oxides

IF 4.5 2区 材料科学 Q1 CRYSTALLOGRAPHY Progress in Crystal Growth and Characterization of Materials Pub Date : 2021-02-01 DOI:10.1016/j.pcrysgrow.2020.100511
Zbigniew Galazka , Steffen Ganschow , Klaus Irmscher , Detlef Klimm , Martin Albrecht , Robert Schewski , Mike Pietsch , Tobias Schulz , Andrea Dittmar , Albert Kwasniewski , Raimund Grueneberg , Saud Bin Anooz , Andreas Popp , Uta Juda , Isabelle M. Hanke , Thomas Schroeder , Matthias Bickermann
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引用次数: 39

Abstract

In the course of development of transparent semiconducting oxides (TSOs) we compare the growth and basic physical properties bulk single crystals of ultra-wide bandgap (UWBG) TSOs, namely β-Ga2O3 and Ga-based spinels MgGa2O4, ZnGa2O4, and Zn1-xMgxGa2O4. High melting points of the materials of about 1800 -1930 °C and their thermal instability, including incongruent decomposition of Ga-based spinels, require additional tools to obtain large crystal volume of high structural quality that can be used for electronic and optoelectronic devices. Bulk β-Ga2O3 single crystals were grown by the Czochralski method with a diameter up to 2 inch, while the Ga-based spinel single crystals either by the Czochralski, Kyropoulos-like, or vertical gradient freeze / Bridgman methods with a volume of several to over a dozen cm3. The UWBG TSOs discussed here have optical bandgaps of about 4.6 - 5 eV and great transparency in the UV / visible spectrum. The materials can be obtained as electrical insulators, n-type semiconductors, or n-type degenerate semiconductors. The free electron concentration (ne) of bulk β-Ga2O3 crystals can be tuned within three orders of magnitude 1016 - 1019 cm−3 with a maximum Hall electron mobility (μ) of 160 cm2V−1s−1, that gradually decreases with ne. In the case of the bulk Ga-based spinel crystals with no intentional doping, the maximum of ne and μ increase with decreasing the Mg content in the compound and reach values of about 1020 cm−3 and about 100 cm2V−1s−1 (at ne > 1019 cm−3), respectively, for pure ZnGa2O4.

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β-Ga2O3和ga基尖晶石体单晶作为超宽带隙透明半导体氧化物
在开发透明半导体氧化物(TSOs)的过程中,我们比较了超宽带隙(UWBG) TSOs,即β-Ga2O3和ga基尖晶石MgGa2O4、ZnGa2O4和Zn1-xMgxGa2O4的生长和基本物理性质。材料的高熔点约为1800 -1930°C,其热不稳定性,包括ga基尖晶石的不一致分解,需要额外的工具来获得可用于电子和光电子器件的高结构质量的大晶体体积。大块β-Ga2O3单晶可以通过Czochralski法生长,直径可达2英寸,而基于ga的尖晶石单晶可以通过Czochralski法、kyropoulos法或垂直梯度冷冻/ Bridgman法生长,体积可达几至十几cm3。本文讨论的UWBG tso具有约4.6 - 5ev的光学带隙,并且在紫外/可见光谱中具有很高的透明度。所述材料可制成电绝缘体、n型半导体或n型简并半导体。体体β-Ga2O3晶体的自由电子浓度(ne)可在1016 ~ 1019 cm−3三个数量级范围内调节,霍尔电子迁移率最大值为160 cm2V−1s−1,随ne的变化而逐渐减小。在未掺杂的体晶尖晶石晶体中,ne和μ的最大值随着化合物中Mg含量的降低而增加,分别达到1020 cm−3和100 cm2V−1s−1(在ne >纯ZnGa2O4为1019 cm−3)。
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来源期刊
Progress in Crystal Growth and Characterization of Materials
Progress in Crystal Growth and Characterization of Materials 工程技术-材料科学:表征与测试
CiteScore
8.80
自引率
2.00%
发文量
10
审稿时长
1 day
期刊介绍: Materials especially crystalline materials provide the foundation of our modern technologically driven world. The domination of materials is achieved through detailed scientific research. Advances in the techniques of growing and assessing ever more perfect crystals of a wide range of materials lie at the roots of much of today''s advanced technology. The evolution and development of crystalline materials involves research by dedicated scientists in academia as well as industry involving a broad field of disciplines including biology, chemistry, physics, material sciences and engineering. Crucially important applications in information technology, photonics, energy storage and harvesting, environmental protection, medicine and food production require a deep understanding of and control of crystal growth. This can involve suitable growth methods and material characterization from the bulk down to the nano-scale.
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