Which low-fusing porcelain glaze treatment technique is better to promote a vitreous surface on Y-TZP ceramic?

Q4 Dentistry Revista Odonto Ciencia Pub Date : 2018-07-25 DOI:10.15448/1980-6523.2017.4.28749
Miranda Js, Natália Veloso Malta, R. D. Carvalho, R. Souza, J. Machado, F. Leite
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引用次数: 2

Abstract

OBJECTIVE: to evaluated the influence of two types of low-fusing porcelain glaze application on the surface of a zirconia ceramics stabilized by yttrium (Y-TZP).METHODS: Y-TZP specimens were divided into five groups (n=5) according the surface treatments: control (CO), no treatment was performed; application of a thin low-fusing porcelain glass layer by the powder/liquid technique (GPL); GPL followed by 10% hydrofluoric acid (HF) etching (GPL-HF); glaze spray application (GS); GS followed by 10% HF etching (GS-HF). Roughness measurements contact angle, x-ray diffraction, energy-dispersive spectroscopy (EDS) and scanning electron microscope (SEM) analysis were performed.RESULTS: ANOVA and Tukey tests revealed that GPL had significantly lower contact angle values than the other groups (GPL:50.31º; GPL-HF: 72.73º; GS-HF: 81.73º; CO: 96.48º; GS:101.30º; p=0.001). GPL-HF presented a significant higher roughness (Ra/Rq: 2658.0/3367.0 ηm; p=0.001) than the other groups (GPL: 872.1/1162.0 ηm; GS-HF: 383.0/603.6 ηm; GS: 303.4/391.3 ηm; CO:263.4/339.1 ηm). The X-ray diffraction analysis just tetragonal phase in all groups. EDS and SEM analysis show a highest amount of silica on GPL and GPL-HF surface.CONCLUSION: the application of the low-fusing porcelain glaze by the powder/liquid technique followed by the HF etching promoted a better surface to micromechanical and chemical adhesion.
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在Y-TZP陶瓷上,哪种低熔釉处理技术能更好地促进玻璃表面的形成?
目的:评价两种低熔点瓷釉对钇稳定氧化锆陶瓷表面的影响。方法:将Y-TZP标本按表面处理分为5组(n=5):对照组(CO),未处理;采用粉末/液体技术(GPL)制备低熔瓷玻璃薄层;GPL接着是10%氢氟酸(HF)蚀刻(GPL-HF);喷釉(GS);然后进行10% HF蚀刻(GS-HF)。粗糙度测量、接触角、x射线衍射、能谱(EDS)和扫描电镜(SEM)分析。结果:方差分析和Tukey检验显示,GPL组的接触角值显著低于其他组(GPL:50.31º;GPL-HF: 72.73º;GS-HF: 81.73º;答:96.48º;g: 101.30º;p = 0.001)。GPL-HF表现出更高的粗糙度(Ra/Rq: 2658.0/3367.0 ηm;p=0.001)高于其他组(GPL: 872.1/1162.0 ηm;GS-HF: 383.0/603.6 ηm;GS: 303.4/391.3 ηm;答:η263.4/339.1米)。x射线衍射分析结果表明,所有基团均为四方相。EDS和SEM分析表明,GPL和GPL- hf表面的二氧化硅含量最高。结论:采用粉末/液体法制备低熔合瓷釉,再进行HF蚀刻,使瓷釉具有较好的表面微观机械和化学附着力。
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来源期刊
Revista Odonto Ciencia
Revista Odonto Ciencia Dentistry-Dentistry (all)
CiteScore
0.30
自引率
0.00%
发文量
0
期刊介绍: Cessation. The Revista Odonto Ciência is a peer-reviewed journal published online (ISSN 1980-6523), four times per year, supported by the Pontifical Catholic University of Rio Grande do Sul – Dental School since 1986. Its abbreviation is Rev Odonto Cienc, which should be used in references, bibliographic legends, and footnotes. The Revista Odonto Ciência is an international scientific journal dedicated to provide a forum for academics, researchers, and practitioners to communicate relevant basic, clinical, education, and epidemiological studies in Dentistry and related fields. The Journal seeks to publish articles on new conceptual models, innovative technology, alternative procedures or treatment to reduce disease burden in the general population or specific groups, thus contributing to translating science into practice and social development. Contributions falling into the following categories will be considered for publication: 1) original research reports of basic and applied oral sciences, epidemiological, and education studies; 2) review article; 3) case report. The Revista Odonto Ciência only accepts manuscripts written in English. Manuscripts submitted to this journal should not have been published before nor have publication pending elsewhere.
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