RF-PLASMA PROTECTIVE COATING ON SILVER- COPPER ALLOYS USING HDMSO/O2/AR PRECURSORS

A. Y., Mohamed, W., Rifai, M., M. N., Abdel Ghany, N.
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Abstract

: Due to its excellent adherence to the metal substrate, Hexamethy-ledisiloxan was employed in the present study to create transparent barrier coating films that protect metal artifacts from corrosion. The deposition procedure used radio frequency plasma enhanced chemical vapor deposition (RF-PECVD). Using scanning electron microscopy combined with energy dispersive X-ray (SEM-EDX) and Fourier-transform infrared spectroscopy (FT-IR), the surfaces of the deposited films were identified and characterized. Atomic force microscopy was used to examine surface topography and roughness (AFM). Water contact angle measurement was used to determine the hydrophobic property (WCA). Moreover, a spectroscopic ellipsometer was used to measure the film's thickness (SE). Following the Siloxane protective layer's PECVD deposition, colo ri - metric measurement (CM) was utilized to assess surface appearance alterations. Electr-ochemical impedance spectroscopy (EIS) was used to study how siloxane coatings for metal substrates protect against corrosion as a function of RF power and gas input composition. It was found that the siloxane thin film's adhesion characteristics to the silver-copper alloy substrate were affected by the substrate pretreatment process and the consumed power during the deposition process.
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以hdmso / o2 / ar为前驱体的银铜合金射频等离子体防护涂层
:由于其与金属基底的良好粘附性,本研究中使用了六甲基莱狄西洛香来制作透明阻挡涂层膜,以保护金属制品免受腐蚀。沉积程序使用射频等离子体增强化学气相沉积(RF-PECVD)。利用扫描电子显微镜结合能量色散X射线(SEM-EDX)和傅立叶变换红外光谱(FT-IR)对沉积薄膜的表面进行了鉴定和表征。原子力显微镜用于检测表面形貌和粗糙度(AFM)。水接触角测量用于确定疏水性(WCA)。此外,使用光谱椭圆仪来测量膜的厚度(SE)。硅氧烷保护层PECVD沉积后,使用色度测量(CM)来评估表面外观变化。电化学阻抗谱(EIS)用于研究金属基底的硅氧烷涂层如何作为RF功率和气体输入成分的函数来防止腐蚀。研究发现,基底预处理工艺和沉积过程中的功耗影响了硅氧烷薄膜与银铜合金基底的粘附特性。
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CiteScore
0.40
自引率
50.00%
发文量
12
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