ALD-Grown Metal Oxide Films for the Detection of Molecular Contaminants on Spacecraft

Abstract

Mitigating molecular contamination during the assembly, integration, and testing of space systems requires quantitative and qualitative methods to detect the presence of molecular films on sensitive surfaces. Atomic layer deposition (ALD) is a self-limiting deposit of a variety of films layer by layer in the vapor phase on multiple types of substrates. The controlled layer-by-layer deposition enables the user to change orientation, morphology, and grain size in films, which directly impacts optical and electronic responses. In this study, the authors demonstrate the ability to use ALD-grown metal oxide thin films coupled with a Raman spectrometer to provide early detection of molecular films on witness surfaces during the assembly, integration, and testing of space flight hardware.