Piezoelectric Performance of Microbial Chitosan Thin Film Derived from Aspergillus oryzae

Muhamad Izzuddin Bin Zamli, M. Akmal, Fazeela Niazi, F. Ahmad, F. Hisham
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引用次数: 1

Abstract

In this study, chitosan thin film derived from Aspergillus oryzae cell walls was fabricated and characterised. First, the chitosan from the fungal biomass was extracted (0.18 g/g) with 52.25% of degree of deacetylation obtained through Fourier transform infrared (FTIR) spectroscopy. Subsequently, several parameters of the chitosan thin film fabrication were optimised, including chitosan solution volume and drying temperature. Resultantly, the highest mechanical quality factor (3.22±0.012), the lowest dissipation factor (0.327±0.0003) and the best tensile strength (13.35±0.045 MPa) were obtained when pure chitosan was dissolved in 35 ml of 0.25 M formic acid and dried at 60 ˚C. In addition, the scanning electron microscopy (SEM) analysis presented a fine chitosan agglomerate distributed in the formic acid. The optimised fabricated, fungal-derived chitosan thin film was validated, recording a mechanical quality factor of 3.68 and dissipation factor of 0.248; both values were comparable to the synthetic polymer, polyvinylidene fluoride (PVDF) thin film. Thus, fungal-derived chitosan thin film can potentially be used as a piezoelectric material.
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米曲霉微生物壳聚糖薄膜的压电性能
本研究制备了米曲霉细胞壁壳聚糖薄膜并对其进行了表征。首先,从真菌生物质中提取壳聚糖(0.18g/g),通过傅立叶变换红外光谱获得52.25%的脱乙酰度。随后,对壳聚糖薄膜制备的几个参数进行了优化,包括壳聚糖溶液体积和干燥温度。结果,当纯壳聚糖溶于35ml 0.25M甲酸中并在60˚C下干燥时,获得了最高的机械品质因数(3.22±0.012)、最低的耗散因数(0.327±0.0003)和最佳的拉伸强度(13.35±0.045MPa)。此外,扫描电子显微镜(SEM)分析显示,在甲酸中分布着精细的壳聚糖团聚体。对优化制造的真菌衍生的壳聚糖薄膜进行了验证,记录了3.68的机械品质因数和0.248的耗散因数;这两个值都与合成聚合物聚偏氟乙烯(PVDF)薄膜相当。因此,真菌衍生的壳聚糖薄膜可以潜在地用作压电材料。
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来源期刊
CiteScore
4.50
自引率
16.00%
发文量
83
审稿时长
8 weeks
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