{"title":"The Role of Annealing on Properties of Silicon Films Deposited By EB-PVD","authors":"میثم زرچی, شاهرخ آهنگرانی","doi":"10.47176/jame.39.1.10611","DOIUrl":null,"url":null,"abstract":": The structural and optical properties of polycrystalline silicon films obtained on a silicon wafer by electron beam physical vapor deposition (EBPVD), were studied in this paper. These films were initially amorphous and changed to a crystalline solid phase during annealing. Annealing was performed in an inert gas atmosphere tube furnace at different temperatures. Micro-structure of the films was analyzed to know the relationship between the crystalline / amorphous composition, grain size and characteristics of the films. The results showed a decrease in roughness with increasing annealing temperature and structural density. Moreover, results of Micro-Raman spectrum showed formation and increase of silicon nanocrystals in the annealed condition when the thickness of the coating increased due to structural defects","PeriodicalId":30992,"journal":{"name":"Journal of Advanced Materials in Engineering","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2020-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Advanced Materials in Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.47176/jame.39.1.10611","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
: The structural and optical properties of polycrystalline silicon films obtained on a silicon wafer by electron beam physical vapor deposition (EBPVD), were studied in this paper. These films were initially amorphous and changed to a crystalline solid phase during annealing. Annealing was performed in an inert gas atmosphere tube furnace at different temperatures. Micro-structure of the films was analyzed to know the relationship between the crystalline / amorphous composition, grain size and characteristics of the films. The results showed a decrease in roughness with increasing annealing temperature and structural density. Moreover, results of Micro-Raman spectrum showed formation and increase of silicon nanocrystals in the annealed condition when the thickness of the coating increased due to structural defects
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