Effect of Benzophenone Type UV Filters on Photodegradation of Co-existing Sulfamethoxazole in Water

Photochem Pub Date : 2023-06-01 DOI:10.3390/photochem3020017
D. Kodikara, Zhongyu Guo, C. Yoshimura
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Abstract

Benzophenones (BPs) frequently occur in water environments, and they are able to both screen UV light and to sensitize reactive intermediate (RI) production. However, BPs have largely been overlooked as a background water component when studying photodegradation of co-existing organic micropollutants (OMPs). Therefore, in this study, we investigated the influence of BP and its derivative oxybenzone (BP3) on the degradation of the co-existing model OMP sulfamethoxazole (SMX). A series of photodegradation experiments were conducted covering a range of BPs concentrations in μg/L levels, and the degradation of 1.00 μM of SMX was studied. The addition of BP at 0.10 μM, 0.25 μM, and 0.30 μM, and BP3 at 0.10 μM and 0.25 μM, significantly increased the first order degradation rate constant of 1.00 μM of SMX (kobs(BP)) by 36.2%, 50.0%, 7.3%, 31.5%, and 36.2% respectively, compared to that in the absence of any BPs. The maximum indirect photodegradation induced by BP and BP3 reached 33.8% and 27.7%, respectively, as a percentage of the observed SMX degradation rate at the [BPs]/[SMX] ratio of 0.25. In general, triplet excited dissolved organic matter (3SMX*, 3BP*, and 3BP3*) played the major role in the photosensitizing ability of BPs. The results further implied that the increase of SMX degradation at the molar ratio of 0.25 was possibly due to 3BP* for the mixture of SMX and BP. Overall, this study revealed the sensitizing ability of BP and BP3 on the co-existing OMP, SMX, in water for the first time. Our findings can be applied to other BP type UV filters which are similar to BP and PB3 in molecular structure.
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二苯甲酮型紫外滤光剂对水中共存磺胺甲恶唑光降解的影响
二苯甲酮(BP)经常出现在水环境中,它们既能屏蔽紫外线,又能敏化反应性中间体(RI)的产生。然而,在研究共存有机微污染物(OMP)的光降解时,BP作为背景水成分在很大程度上被忽视了。因此,在本研究中,我们研究了BP及其衍生物氧苯酮(BP3)对共存模型OMP-磺胺甲恶唑(SMX)降解的影响。在μg/L浓度范围内进行了一系列光降解实验,研究了1.00μM SMX的降解情况。与不存在任何BP的情况相比,添加0.10μM、0.25μM和0.30μM的BP以及0.10μM和0.25μM的BP3,使1.00μM的SMX(kobs(BP))的一级降解速率常数分别显著增加了36.2%、50.0%、7.3%、31.5%和36.2%。在[BPs]/[SMX]比率为0.25时,BP和BP3诱导的最大间接光降解分别达到33.8%和27.7%,占观察到的SMX降解率的百分比。通常,三重态激发的溶解有机物(3SMX*、3BP*和3BP3*)在BPs的光敏能力中起主要作用。结果进一步表明,在摩尔比为0.25时,SMX降解的增加可能是由于SMX和BP的混合物的3BP*。总之,本研究首次揭示了BP和BP3对水中共存的OMP、SMX的增敏能力。我们的研究结果可应用于其他在分子结构上与BP和PB3相似的BP型紫外线滤光片。
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