{"title":"Patent citing patterns of foreign firms: an analysis of Indian IT services industry","authors":"Aparna Sharma, Ruchi Sharma","doi":"10.1080/19761597.2022.2026234","DOIUrl":null,"url":null,"abstract":"ABSTRACT This study captures the origin and pattern of foreign knowledge inflows to the Indian IT services industry using patent citation data. It examines the patterns of backward patent citations by the US origin and non-US origin foreign IT services firms operating in India using the USPTO patent citation data from 2013 to 2017. To analyze the citing patterns of firms, we classified backward citations into two categories: self-citations and non-self-citations. Our study finds that patents granted to the US origin firms hold a relatively higher number of backward citations and a higher average number of inventors. It indicates that the Indian IT services industry receives more complex technology inflows from the US origin firms compared to non-US origin firms. It also shows a positive relationship between self-citations and lowers patent grant lag. Further, this study suggests that more self-citations by the US origin firms reinforce more patents that develop a patent cycle for a firm. Therefore, the US origin firms in the Indian IT services industry dominate in patenting activities at USPTO.","PeriodicalId":1,"journal":{"name":"Accounts of Chemical Research","volume":null,"pages":null},"PeriodicalIF":16.4000,"publicationDate":"2022-01-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Accounts of Chemical Research","FirstCategoryId":"91","ListUrlMain":"https://doi.org/10.1080/19761597.2022.2026234","RegionNum":1,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 2
Abstract
ABSTRACT This study captures the origin and pattern of foreign knowledge inflows to the Indian IT services industry using patent citation data. It examines the patterns of backward patent citations by the US origin and non-US origin foreign IT services firms operating in India using the USPTO patent citation data from 2013 to 2017. To analyze the citing patterns of firms, we classified backward citations into two categories: self-citations and non-self-citations. Our study finds that patents granted to the US origin firms hold a relatively higher number of backward citations and a higher average number of inventors. It indicates that the Indian IT services industry receives more complex technology inflows from the US origin firms compared to non-US origin firms. It also shows a positive relationship between self-citations and lowers patent grant lag. Further, this study suggests that more self-citations by the US origin firms reinforce more patents that develop a patent cycle for a firm. Therefore, the US origin firms in the Indian IT services industry dominate in patenting activities at USPTO.
期刊介绍：
Accounts of Chemical Research presents short, concise and critical articles offering easy-to-read overviews of basic research and applications in all areas of chemistry and biochemistry. These short reviews focus on research from the author’s own laboratory and are designed to teach the reader about a research project. In addition, Accounts of Chemical Research publishes commentaries that give an informed opinion on a current research problem. Special Issues online are devoted to a single topic of unusual activity and significance.
Accounts of Chemical Research replaces the traditional article abstract with an article "Conspectus." These entries synopsize the research affording the reader a closer look at the content and significance of an article. Through this provision of a more detailed description of the article contents, the Conspectus enhances the article's discoverability by search engines and the exposure for the research.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
