Study the hall effect and DC conductivity of CdSe and Te doped CdSe thin films prepared by RF magnetron sputtering method

IF 2.2 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Materials Letters: X Pub Date : 2023-06-01 DOI:10.1016/j.mlblux.2023.100204
Devendra Kumar , Chiranji Lal , Dharm Veer , Deshraj Singh , Pawan Kumar , Ram S. Katiyar
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引用次数: 1

Abstract

CdSe and CdSe:Te thin films were grown on Si p-type substrates by RF magnetron sputtering method. The doping percentage of Tellurium (Te) in CdSe was 7% for the CdSe:Te thin film. The results show that after the doping of Te in the CdSe thin film, the conductivity changes from n-type to p-type and the mobility of the CdSe thin film increased. The conductivity of Te doped CdSe was found to be in order of 10−6 Ω−1 cm−1, while without doping it was 10−5 Ω−1 cm−1. X-ray diffraction (XRD) confirmed the presence of CdSe, Te and Si.

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射频磁控溅射法制备CdSe和Te掺杂CdSe薄膜的霍尔效应和直流电导率研究
采用射频磁控溅射法在Si - p型衬底上生长了CdSe和CdSe薄膜。碲(Te)在CdSe薄膜中的掺杂率为7%。结果表明,Te掺杂CdSe薄膜后,CdSe薄膜的电导率由n型转变为p型,薄膜的迁移率提高。Te掺杂CdSe的电导率为10−6 Ω−1 cm−1,而未掺杂CdSe的电导率为10−5 Ω−1 cm−1。x射线衍射(XRD)证实了CdSe、Te和Si的存在。
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CiteScore
3.10
自引率
0.00%
发文量
50
审稿时长
114 days
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