The Self-Absorption Effect of Ni-63 Beta Source to the Silicon Carbide based Betavoltaic Battery

S. Rahastama, Yohannes Dwi Saputra, A. Waris
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引用次数: 2

Abstract

A typical planar structure is the most feasible conceptual design of betavoltaic battery due to its simplicity. The self-absorption of beta source, however, causes a limitation to the geometrical efficiency.  Herein, we tried to investigate the self-absorption event in Ni-63 beta source by changing the geometrical aspects and evaluated its effect on each layer of a 4H-SiC semiconductor as the radiation-electricity converter. The design configuration from previous literature was adopted and the model was developed using Monte Carlo N-Particle X (MCNPX) consists of radioisotope source, semiconductor, and also ohmic contacts. The energy of beta emission was adjusted to the actual Ni-63 beta spectra with an isotropic distribution of ejected particles. The average beta energy deposition degrades along with the addition of source mass thickness, but the n+ substrate has a unique result where a peak is observed at 0.1246 mg/cm2 due to the self-absorption effect. Furthermore, the rectangular surface area magnification gives a positive impact on the beta energy deposition up to 2.48% and the photon average energy deposition up to 137.21%.  The results of average electron absorbed dose are consistent with Oldano-Pasquarelli semi-empirical theory of self-absorption in the beta source, where the upper layer receives a wider angular distribution of particles compared to the lower one, which corresponds to the counting geometrical coefficients.
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Ni-63源对碳化硅基倍他伏打电池的自吸收效应
典型的平面结构由于其简单性是最可行的倍他伏打电池概念设计。然而,β源的自吸收对几何效率造成了限制。本文中,我们试图通过改变Ni-63 β源的几何方面来研究自吸收事件,并评估其对作为辐射-电转换器的4H-SiC半导体各层的影响。采用前人文献的设计配置,采用蒙特卡罗n粒子X (MCNPX)模型开发,该模型由放射性同位素源、半导体和欧姆接触组成。发射能量调整为实际Ni-63 β光谱,发射粒子呈各向同性分布。平均β能量沉积随着源质量厚度的增加而降低,但n+衬底有一个独特的结果,由于自吸收效应,在0.1246 mg/cm2处观察到一个峰值。此外,矩形表面积放大对β能量沉积有2.48%的正向影响,对光子平均能量沉积有137.21%的正向影响。平均电子吸收剂量的结果与Oldano-Pasquarelli自吸收的半经验理论相一致,其中上层比下层接收到更宽的粒子角分布,这与计数几何系数相对应。
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