A Ka-Band SiGe BiCMOS Quasi-F−1 Power Amplifier Using a Parasitic Capacitance Cancellation Technique †

IF 1.6 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Low Power Electronics and Applications Pub Date : 2023-03-24 DOI:10.3390/jlpea13020023
Vasileios Manouras, Ioannis Papananos
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Abstract

This paper deals with the design, analysis, and implementation of a Ka-band, single-stage, quasi-inverse class F power amplifier (PA). A detailed methodology for the evaluation of the active device’s output capacitance is described, enabling the designing of a second-harmonically tuned load and resulting in enhanced performance. A simplified model for the extraction of time-domain intrinsic voltage and current waveforms at the output of the main active core is introduced, enforcing the implementation process of the proposed quasi-inverse class F technique. The PA is fabricated in a 130 nm SiGe BiCMOS technology with fT/fmax=250/370 GHz and it is suitable for 5G applications. It achieves 33% peak power-added efficiency (PAE), 18.8 dBm saturation output power Psat, and 14.7 dB maximum large-signal power gain G at the operating frequency of 38 GHz. The PA’s response is also tested under a modulated-signal excitation and simulation results are denoted in this paper. The chip size is 0.605×0.712 mm2 including all pads.
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使用寄生电容消除技术的Ka波段SiGe-BiCMOS Quasi-F−1功率放大器†
本文讨论了一种ka波段单级准逆F类功率放大器的设计、分析和实现。描述了评估有源器件输出电容的详细方法,从而能够设计二次谐波调谐负载并提高性能。介绍了主有源铁芯输出端时域本征电压和电流波形提取的简化模型,加强了拟逆F类技术的实现过程。该PA采用130 nm SiGe BiCMOS技术制造,fT/fmax=250/370 GHz,适合5G应用。在38ghz工作频率下,峰值功率增加效率(PAE)为33%,饱和输出功率Psat为18.8 dBm,最大大信号功率增益G为14.7 dB。本文还对调制信号激励下的PA响应进行了测试,并给出了仿真结果。芯片尺寸为0.605×0.712 mm2,包括所有的衬垫。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Low Power Electronics and Applications
Journal of Low Power Electronics and Applications Engineering-Electrical and Electronic Engineering
CiteScore
3.60
自引率
14.30%
发文量
57
审稿时长
11 weeks
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