Ultrashort pulsed laser induced complex surface structures generated by tailoring the melt hydrodynamics

IF 15.3 1区 物理与天体物理 Q1 OPTICS Opto-Electronic Advances Pub Date : 2021-04-27 DOI:10.29026/oea.2022.210052
F. Fraggelakis, G. Tsibidis, E. Stratakis
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引用次数: 24

Abstract

We present a novel approach for tailoring the laser induced surface topography upon femtosecond (fs) pulsed laser irradiation. The method employs spatially controlled double fs laser pulses to actively regulate the hydrodynamic microfluidic motion of the melted layer that gives rise to the structures formation. The pulse train used, in particular, consists of a previously unexplored spatiotemporal intensity combination including one pulse with Gaussian and another with periodically modulated intensity distribution created by Direct Laser Interference Patterning (DLIP). The interpulse delay is appropriately chosen to reveal the contribution of the microfluidic melt flow, while it is found that the sequence of the Gaussian and DLIP pulses remarkably influences the surface profile attained. Results also demonstrate that both the spatial intensity of the double pulse and the effective number of pulses per irradiation spot can further be modulated to control the formation of complex surface morphologies. The underlying physical processes behind the complex patterns’ generation were interpreted in terms of a multiscale model combining electrodynamic excitation with melt hydrodynamics. We believe that this work can constitute a significant step forward towards producing laser induced surface structures on demand by tailoring the melt microfluidic phenomena.
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通过调整熔体流体力学产生超短脉冲激光诱导的复杂表面结构
我们提出了一种在飞秒(fs)脉冲激光照射下调整激光诱导表面形貌的新方法。该方法采用空间控制的双fs激光脉冲来主动调节熔化层的流体动力学微流体运动,从而形成结构。特别地,所使用的脉冲串由先前未探索的时空强度组合组成,包括一个具有高斯的脉冲和另一个具有由直接激光干涉图案化(DLIP)创建的周期性调制强度分布的脉冲。适当选择脉冲间延迟来揭示微流体熔体流动的贡献,同时发现高斯脉冲和DLIP脉冲的顺序显著影响所获得的表面轮廓。结果还表明,可以进一步调节双脉冲的空间强度和每个照射点的有效脉冲数,以控制复杂表面形貌的形成。根据将电动激励与熔体流体力学相结合的多尺度模型,解释了复杂图案生成背后的潜在物理过程。我们相信,这项工作可以通过定制熔体微流体现象,朝着按需生产激光诱导的表面结构迈出重要一步。
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来源期刊
CiteScore
19.30
自引率
7.10%
发文量
128
期刊介绍: Opto-Electronic Advances (OEA) is a distinguished scientific journal that has made significant strides since its inception in March 2018. Here's a collated summary of its key features and accomplishments: Impact Factor and Ranking: OEA boasts an impressive Impact Factor of 14.1, which positions it within the Q1 quartiles of the Optics category. This high ranking indicates that the journal is among the top 25% of its field in terms of citation impact. Open Access and Peer Review: As an open access journal, OEA ensures that research findings are freely available to the global scientific community, promoting wider dissemination and collaboration. It upholds rigorous academic standards through a peer review process, ensuring the quality and integrity of the published research. Database Indexing: OEA's content is indexed in several prestigious databases, including the Science Citation Index (SCI), Engineering Index (EI), Scopus, Chemical Abstracts (CA), and the Index to Chinese Periodical Articles (ICI). This broad indexing facilitates easy access to the journal's articles by researchers worldwide. Scope and Purpose: OEA is committed to serving as a platform for the exchange of knowledge through the publication of high-quality empirical and theoretical research papers. It covers a wide range of topics within the broad area of optics, photonics, and optoelectronics, catering to researchers, academicians, professionals, practitioners, and students alike.
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