A Low-Temperature Curable Conformal Adhesive Layer for Monolithic Lamination of Thin Film Encapsulation

Yong Cheon Park, Kihoon Jeong, Dahye Ahn, Youson Kim, S. Im
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Abstract

Lamination of thin film encapsulation (TFE) layer is regarded as one of the most promising methods that enables the reliable operation of organic electronic devices by attaching the TFE layers thereon directly using an adhesive layer. In this study, a low-temperature curable adhesive thin film with low glass transition temperature (Tg) is newly designed and synthesized. Low Tg allows conformal contact at the interface of the adhesive layer and the substrate subsequently leads to the enhancement of adhesion, and thus the barrier performance of the lamination of barrier film. In order to fabricate a low-Tg adhesive layer, glycidyl methacrylate (GMA) was copolymerized with 2-hydroxyethyl acrylate (HEA) monomer in vapor phase via initiated chemical vapor deposition. With a 5 μm-thick p(GMA-co-HEA) adhesive layer, a strong adhesion was readily achieved by curing it at 60 ℃ for 1 hr, with the peel strength of 16.6 N/25 mm, and the water vapor transmission rate (WVTR) of glass laminated encapsulation was as low as 3.4×10-3 g/m2∙day at an accelerating condition (38 ℃, 90% relative humidity). We believe the low-temperature curable thin adhesive layer will serve as a powerful material for the lamination of organic electronic devices in damage-free way.

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用于薄膜封装整体层合的低温固化保形胶粘剂
薄膜封装(TFE)层的层压被认为是最有前途的方法之一,该方法通过使用粘合剂层将TFE层直接附着在其上来实现有机电子器件的可靠操作。本研究设计并合成了一种具有低玻璃化转变温度(Tg)的低温固化粘合剂薄膜。低Tg允许在粘合剂层和衬底的界面处的共形接触,随后导致粘合性的增强,并因此导致阻挡膜的层压的阻挡性能。为了制备低Tg的粘合层,通过引发化学气相沉积将甲基丙烯酸缩水甘油酯(GMA)与丙烯酸2-羟基乙酯(HEA)单体在气相中共聚。采用5μm厚的p(GMA-co-HEA)粘合层,在60℃下固化1小时,可获得很强的粘合性,剥离强度为16.6N/25mm,在加速条件下(38℃,90%相对湿度),玻璃层压封装的水蒸气透过率(WVTR)低至3.4×10-3g/m2∙天。我们相信低温可固化的薄粘合层将成为一种强大的材料,用于无损伤地层压有机电子器件。
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CiteScore
3.70
自引率
0.00%
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0
审稿时长
12 weeks
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