Stabilization of Nanocrystalline Copper by Tantalum Grain Boundary Segregation

Sufeng Wei, Xinming Hu, Xianglei Liu, Guoyong Wang
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Abstract

Nanocrystalline Cu-Ta alloy films were deposited on glass slides by magnetron sputtering. Microstructure characterization proved that most of the tantalum atoms are segregated in the grain boundaries. Nanoindentation creep measurements were performed on it to uncover the stability mechanism of grain boundary segregation on nanocrystalline materials. It is found that segregation can effectively slow down the creep strain rate and the grain boundary activities. The suppressed grain boundary activities endow the alloy with a stable microstructure during plastic deformation and annealing.
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钽晶界偏析对铜纳米晶的稳定作用
采用磁控溅射法在载玻片上沉积了纳米Cu-Ta合金薄膜。微观结构表征证明,大多数钽原子在晶界处偏析。对其进行了纳米压痕蠕变测试,揭示了纳米晶材料晶界偏析的稳定机制。研究发现,偏析能有效地减缓蠕变应变速率和晶界活性。晶界活性的抑制使合金在塑性变形和退火过程中具有稳定的微观组织。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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