Structure, vibrations and electronic transport in silicon suboxides: Application to physical unclonable functions

Q1 Physics and Astronomy Journal of Non-Crystalline Solids: X Pub Date : 2023-06-01 DOI:10.1016/j.nocx.2023.100179
C. Ugwumadu , K.N. Subedi , R. Thapa , P. Apsangi , S. Swain , M.N. Kozicki , D.A. Drabold
{"title":"Structure, vibrations and electronic transport in silicon suboxides: Application to physical unclonable functions","authors":"C. Ugwumadu ,&nbsp;K.N. Subedi ,&nbsp;R. Thapa ,&nbsp;P. Apsangi ,&nbsp;S. Swain ,&nbsp;M.N. Kozicki ,&nbsp;D.A. Drabold","doi":"10.1016/j.nocx.2023.100179","DOIUrl":null,"url":null,"abstract":"<div><p>This work focuses on the structure and electronic transport in atomistic models of silicon suboxides (a-SiO<sub><em>x</em></sub>; <em>x</em> = 1.3,1.5 and 1.7) used in the fabrication of a Physical Unclonable Function (PUF) devices. Molecular dynamics and density functional theory simulations were used to obtain the structural, electronic, and vibrational properties that contribute to electronic transport in a-SiO<sub><em>x</em></sub>. The percentage of Si-[Si<sub>1</sub>, O<sub>3</sub>] and Si-[Si<sub>3</sub>, O<sub>1</sub>], observed in a-SiO<sub>1.3</sub>, decrease with increasing O ratio. Vibrations in a-SiO<sub><em>x</em></sub> showed peaks that result from topological defects. The electronic conduction path in a-SiO<sub><em>x</em></sub> favored Si-rich regions and Si atoms with dangling bonds formed charge-trapping sites. For doped a-SiO<sub><em>x</em></sub>, the type of doping results in new conduction paths, hence qualifying a-SiOx as a viable candidate for PUF fabrication as reported by Kozicki [Patent-Publication-No.: US2021/0175185A1, 2021].</p></div>","PeriodicalId":37132,"journal":{"name":"Journal of Non-Crystalline Solids: X","volume":"18 ","pages":"Article 100179"},"PeriodicalIF":0.0000,"publicationDate":"2023-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Non-Crystalline Solids: X","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2590159123000316","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"Physics and Astronomy","Score":null,"Total":0}
引用次数: 1

Abstract

This work focuses on the structure and electronic transport in atomistic models of silicon suboxides (a-SiOx; x = 1.3,1.5 and 1.7) used in the fabrication of a Physical Unclonable Function (PUF) devices. Molecular dynamics and density functional theory simulations were used to obtain the structural, electronic, and vibrational properties that contribute to electronic transport in a-SiOx. The percentage of Si-[Si1, O3] and Si-[Si3, O1], observed in a-SiO1.3, decrease with increasing O ratio. Vibrations in a-SiOx showed peaks that result from topological defects. The electronic conduction path in a-SiOx favored Si-rich regions and Si atoms with dangling bonds formed charge-trapping sites. For doped a-SiOx, the type of doping results in new conduction paths, hence qualifying a-SiOx as a viable candidate for PUF fabrication as reported by Kozicki [Patent-Publication-No.: US2021/0175185A1, 2021].

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硅氧烷的结构、振动和电子输运:在物理不可克隆功能中的应用
这项工作的重点是用于制造物理不可控制函数(PUF)器件的低硅氧化物(a-SiOx;x=1.3、1.5和1.7)的原子模型中的结构和电子输运。分子动力学和密度泛函理论模拟用于获得有助于a-SiOx中电子输运的结构、电子和振动特性。在a-SiO1.3中观察到的Si-[Si1,O3]和Si-[Si2,O1]的百分比随着O比的增加而降低。a-SiOx中的振动显示出由拓扑缺陷引起的峰值。a-SiOx中的电子传导路径有利于富硅区域,具有悬空键的Si原子形成电荷捕获位点。对于掺杂的a-SiOx,掺杂类型导致新的传导路径,因此如Kozicki[专利公开号:US2021/0175185A12021]所报道的,a-SiOx有资格成为PUF制造的可行候选者。
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来源期刊
Journal of Non-Crystalline Solids: X
Journal of Non-Crystalline Solids: X Materials Science-Materials Chemistry
CiteScore
3.20
自引率
0.00%
发文量
50
审稿时长
76 days
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Editorial Board Preface Preface Altering the optical, physical, and TL Dosimetric properties of MgSO4:Dy2O3:B2O3 transparent glass ceramic system: Evaluating the impact of roughness control and ZnO inclusion Editorial Board
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