SILICON SURFACE PATTERNING BY GLOW DISCHARGE PLASMA

IF 0.5 4区 工程技术 Q4 MECHANICS Journal of Applied Mechanics and Technical Physics Pub Date : 2023-08-21 DOI:10.1134/S0021894423030136
A. V. Petrova, A. L. Bogoslovtseva, S. V. Starinskiy, A. I. Safonov
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Abstract

The possibility of changing the silicon surface morphology at certain glow discharge parameters is shown. It is established that oxidation is the main process influencing the surface morphology during glow discharge plasma treatment. As a result of processing in the investigated parameter range, various stages of the surface oxidation process are observed: the formation of a uniform oxide layer and the formation of nano- and microstructures of silicon oxide. It is shown that these processes lead to surface modification, which acquires stable hydrophilic and superhydrophilic properties.

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发光放电等离子体的硅表面图案化
给出了在一定辉光放电参数下改变硅表面形貌的可能性。结果表明,在辉光放电等离子体处理过程中,氧化是影响表面形貌的主要过程。在所研究的参数范围内加工的结果,观察到表面氧化过程的各个阶段:形成均匀的氧化层和形成氧化硅的纳米和微观结构。结果表明,这些过程导致了表面改性,获得了稳定的亲水性和超亲水性。
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来源期刊
CiteScore
1.20
自引率
16.70%
发文量
43
审稿时长
4-8 weeks
期刊介绍: Journal of Applied Mechanics and Technical Physics is a journal published in collaboration with the Siberian Branch of the Russian Academy of Sciences. The Journal presents papers on fluid mechanics and applied physics. Each issue contains valuable contributions on hypersonic flows; boundary layer theory; turbulence and hydrodynamic stability; free boundary flows; plasma physics; shock waves; explosives and detonation processes; combustion theory; multiphase flows; heat and mass transfer; composite materials and thermal properties of new materials, plasticity, creep, and failure.
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