Photo-induced Electron Emission of Nanostructured Carbon Thin Film Based Transmission Photocathodes at Different Electric Field

IF 0.5 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC Advances in Electrical and Electronic Engineering Pub Date : 2022-04-01 DOI:10.15598/aeee.v20i1.4138

J. Huran, V. Sasinková, M. Nozdrin, E. Kováčová, A. Kobzev, A. Kleinová

{"title":"Photo-induced Electron Emission of Nanostructured Carbon Thin Film Based Transmission Photocathodes at Different Electric Field","authors":"J. Huran, V. Sasinková, M. Nozdrin, E. Kováčová, A. Kobzev, A. Kleinová","doi":"10.15598/aeee.v20i1.4138","DOIUrl":null,"url":null,"abstract":"Very thin nanostructured carbon films were deposited on quartz substrate by reactive magnetron sputtering using graphite target and gas mixture of Ar and reactive gas N2 or N2+H2. Film thicknesses were in the range of 20–25 nm. Rutherford backscattering spectrometry and Elastic recoil detection analytical method determined the concentration of elements in the films. Scanning electron microscopy scanned the surface morphology of carbon films. Raman spectroscopy was used for chemical structural properties determination of very thin carbon films. Raman spectra intensities were fitted with Gaussian peaks. The photo-induced (pulsed laser 266 nm) electron emission properties of very thin nanostructured carbon films were investigated by the measurement of cathode bunch charge at different electric field and calculate quantum efficiency. The influence of different electric field on the photo-induced electron emission characteristics of prepared transmission photocathodes are discussed.","PeriodicalId":7268,"journal":{"name":"Advances in Electrical and Electronic Engineering","volume":null,"pages":null},"PeriodicalIF":0.5000,"publicationDate":"2022-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Electrical and Electronic Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.15598/aeee.v20i1.4138","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

引用次数: 0

Abstract

Very thin nanostructured carbon films were deposited on quartz substrate by reactive magnetron sputtering using graphite target and gas mixture of Ar and reactive gas N2 or N2+H2. Film thicknesses were in the range of 20–25 nm. Rutherford backscattering spectrometry and Elastic recoil detection analytical method determined the concentration of elements in the films. Scanning electron microscopy scanned the surface morphology of carbon films. Raman spectroscopy was used for chemical structural properties determination of very thin carbon films. Raman spectra intensities were fitted with Gaussian peaks. The photo-induced (pulsed laser 266 nm) electron emission properties of very thin nanostructured carbon films were investigated by the measurement of cathode bunch charge at different electric field and calculate quantum efficiency. The influence of different electric field on the photo-induced electron emission characteristics of prepared transmission photocathodes are discussed.

查看原文

微信好友朋友圈 QQ好友复制链接

本刊更多论文

不同电场下纳米结构碳薄膜基透射光电阴极的光致电子发射

采用反应磁控溅射技术，在石英衬底上制备了极薄的纳米结构碳薄膜。膜厚在20 ~ 25 nm之间。卢瑟福后向散射光谱法和弹性反冲检测法测定了薄膜中元素的浓度。扫描电镜扫描了碳膜的表面形貌。采用拉曼光谱法测定了极薄碳膜的化学结构性质。拉曼光谱强度采用高斯峰拟合。通过测量不同电场下的阴极束电荷并计算量子效率，研究了极薄纳米结构碳薄膜的光致(脉冲激光)电子发射特性。讨论了不同电场对制备的透射式光电阴极光致电子发射特性的影响。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文去求助

来源期刊