Optimisation of spin coating parameters for the preparation of ZnO thin films by Grey-Taguchi method

A. Vivek, Akshay Chavan, B. Shivaraj, H. Murthy, M. Krishna, B. Sathyanarayana
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引用次数: 3

Abstract

This work studies the influence of spin coating process parameters on grain size and surface roughness of zinc oxide (ZnO) thin films by sol gel using Taguchi method. ZnO thin films were prepared using zinc acetate dehydrate (ZAD), methanol and diethanolamine (DEA) as the starting material, solvent and stabilising agent respectively. The coating parameters such as precursor concentration of ZAD (0.5, 0.6 and 0.7 M), spin speed (1,500, 2,500 and 3,500 rpm) and annealing temperature (300,400 and 500 °c) was selected and the influence of these parameters on grain size and surface roughness was studied using X-ray diffraction (XRD) and atomic force microscopy (AFM). ANOVA results showed that annealing temperature had 53% effect on grain size and chuck rotation speed had 40% effect on the surface roughness of the film. Using Grey relation technique the optimised parameters was found to be 0.5 M, 2,500 rpm and 400°C. The grain size decreased from 18.054 nm to 16.97 nm and roughness of film decreased from 230.47 nm to 223.5 nm.
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Grey-Taguchi法制备ZnO薄膜的旋涂参数优化
本文采用田口法研究了旋涂工艺参数对溶胶凝胶氧化锌薄膜晶粒尺寸和表面粗糙度的影响。分别以乙酸锌(ZAD)、甲醇和二乙醇胺(DEA)为原料、溶剂和稳定剂制备了ZnO薄膜。选择了ZAD前体浓度(0.5、0.6和0.7M)、旋转速度(1500、2500和3500rpm)和退火温度(300400和500°c)等涂层参数,并使用X射线衍射(XRD)和原子力显微镜(AFM)研究了这些参数对晶粒尺寸和表面粗糙度的影响。方差分析结果表明,退火温度对薄膜的晶粒尺寸有53%的影响,卡盘转速对薄膜表面粗糙度有40%的影响。使用灰色关联技术,发现优化参数为0.5 M、2500 rpm和400°C。晶粒尺寸从18.054nm减小到16.97nm,膜的粗糙度从230.47nm减小到223.5nm。
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International Journal of Nanomanufacturing
International Journal of Nanomanufacturing Engineering-Industrial and Manufacturing Engineering
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