A New Chemical Mechanical Slurry for Polishing Yttrium Aluminium Garnet Material with Magnesium oxide, Sodium Metasilicate Pentahydrate and Zirconium Dioxide Abrasive Particles
{"title":"A New Chemical Mechanical Slurry for Polishing Yttrium Aluminium Garnet Material with Magnesium oxide, Sodium Metasilicate Pentahydrate and Zirconium Dioxide Abrasive Particles","authors":"LeManh Duc, P. Hiếu, N. Quang","doi":"10.36897/jme/159661","DOIUrl":null,"url":null,"abstract":"This work provided a new chemical-mechanical polishing mixture with MgO, sodium metasilicate pentahydrate, ZrO 2 abrasive particles, and deionized water. With chemical-mechanical slurry (CMS) proposed for polishing yttrium aluminum oxide (Y 3 Al 5 O 12 ) the surface reaction layer formed with significantly reduced hardness compared to other Y 3 Al 5 O 12 materials, these products combine with MgO to form montmorillonites (3MgO–Al 2 O 3 –3SiO 2 –3Y 2 O 3 – 5Al 2 O 3 ). With this formation, the surface layer of Y 3 Al 5 O 12 material becomes soft and is easily removed by ZrO 2 abrasive particles under the influence of mechanical polishing, resulting in superfine surfaces generated from the proposed CMS model. The experimental results show that the surface quality with CMS proposed gives the surface quality with Ra = 0.471 nm along with the material removal rate 31 (nm/min). Surface quality is improved by 71% along with a superior material removal rate (increased by 287%) compared to silica slurry. The results show excellent polishing ability from CMS proposed for polishing Y3Al5O12 materials.","PeriodicalId":37821,"journal":{"name":"Journal of Machine Engineering","volume":" ","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-02-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Machine Engineering","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.36897/jme/159661","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 2
Abstract
This work provided a new chemical-mechanical polishing mixture with MgO, sodium metasilicate pentahydrate, ZrO 2 abrasive particles, and deionized water. With chemical-mechanical slurry (CMS) proposed for polishing yttrium aluminum oxide (Y 3 Al 5 O 12 ) the surface reaction layer formed with significantly reduced hardness compared to other Y 3 Al 5 O 12 materials, these products combine with MgO to form montmorillonites (3MgO–Al 2 O 3 –3SiO 2 –3Y 2 O 3 – 5Al 2 O 3 ). With this formation, the surface layer of Y 3 Al 5 O 12 material becomes soft and is easily removed by ZrO 2 abrasive particles under the influence of mechanical polishing, resulting in superfine surfaces generated from the proposed CMS model. The experimental results show that the surface quality with CMS proposed gives the surface quality with Ra = 0.471 nm along with the material removal rate 31 (nm/min). Surface quality is improved by 71% along with a superior material removal rate (increased by 287%) compared to silica slurry. The results show excellent polishing ability from CMS proposed for polishing Y3Al5O12 materials.
本工作提供了一种新的化学机械抛光混合物,其中含有MgO、五水偏硅酸钠、ZrO2磨料颗粒和去离子水。采用化学机械浆料(CMS)抛光钇铝氧化物(Y 3 Al 5 O 12),与其他Y 3 Al 2 O 12材料相比,形成的表面反应层硬度显著降低,这些产物与MgO结合形成蒙脱石(3MgO–Al 2 O 3–3SiO 2–3Y 2 O 3-5Al 2 O 3)。通过这种形成,Y3Al5O12材料的表面层变得柔软,并且在机械抛光的影响下很容易被ZrO2磨粒去除,从而产生由所提出的CMS模型产生的超细表面。实验结果表明,所提出的CMS的表面质量给出了Ra=0.471nm的表面质量以及31(nm/min)的材料去除率。与二氧化硅浆料相比,表面质量提高了71%,材料去除率更高(提高了287%)。结果表明,CMS对Y3Al5O12材料具有良好的抛光性能。
期刊介绍:
ournal of Machine Engineering is a scientific journal devoted to current issues of design and manufacturing - aided by innovative computer techniques and state-of-the-art computer systems - of products which meet the demands of the current global market. It favours solutions harmonizing with the up-to-date manufacturing strategies, the quality requirements and the needs of design, planning, scheduling and production process management. The Journal'' s subject matter also covers the design and operation of high efficient, precision, process machines. The Journal is a continuator of Machine Engineering Publisher for five years. The Journal appears quarterly, with a circulation of 100 copies, with each issue devoted entirely to a different topic. The papers are carefully selected and reviewed by distinguished world famous scientists and practitioners. The authors of the publications are eminent specialists from all over the world and Poland. Journal of Machine Engineering provides the best assistance to factories and universities. It enables factories to solve their difficult problems and manufacture good products at a low cost and fast rate. It enables educators to update their teaching and scientists to deepen their knowledge and pursue their research in the right direction.