Melquisedec Vicente Mendoza , Edgar Serrano Peréz , Fernando Juárez López
{"title":"Alumina deposited by metal-organic chemical vapour deposition process on NiCoCrAlYTa superalloy","authors":"Melquisedec Vicente Mendoza , Edgar Serrano Peréz , Fernando Juárez López","doi":"10.1016/j.mlblux.2022.100160","DOIUrl":null,"url":null,"abstract":"<div><p>Alumina deposit was produced by metalorganic chemical vapour deposition process on a NiCoCrAlY superalloy substrate. Low frequency injection in the range 5–10 Hz was used to feed the Aluminium Tri-isopropoxide precursor into a deposit chamber holding at 400 °C of temperature. Both scanning electron microscopy and X-ray diffraction analysis were accomplished to characterize the deposited alumina. Topographic images show an alumina deposit roughness of Ra 35 nm measured by atomic force microscopy. An X-photon spectroscopy analysis of the alumina deposit was performed to identify both Al species and chemical analysis. Thermo-gravimetric analysis was conducted to assess the effect of deposited alumina on the superalloy.</p></div>","PeriodicalId":18245,"journal":{"name":"Materials Letters: X","volume":"15 ","pages":"Article 100160"},"PeriodicalIF":2.2000,"publicationDate":"2022-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2590150822000400/pdfft?md5=c398d038917eeadf39dea9ed4ab350c7&pid=1-s2.0-S2590150822000400-main.pdf","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Letters: X","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2590150822000400","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 2
Abstract
Alumina deposit was produced by metalorganic chemical vapour deposition process on a NiCoCrAlY superalloy substrate. Low frequency injection in the range 5–10 Hz was used to feed the Aluminium Tri-isopropoxide precursor into a deposit chamber holding at 400 °C of temperature. Both scanning electron microscopy and X-ray diffraction analysis were accomplished to characterize the deposited alumina. Topographic images show an alumina deposit roughness of Ra 35 nm measured by atomic force microscopy. An X-photon spectroscopy analysis of the alumina deposit was performed to identify both Al species and chemical analysis. Thermo-gravimetric analysis was conducted to assess the effect of deposited alumina on the superalloy.
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