Schottky barrier height engineering on MoS2 field-effect transistors using a polymer surface modifier on a contact electrode

IF 4.703 3区 材料科学 Nanoscale Research Letters Pub Date : 2023-05-31 DOI:10.1186/s11671-023-03855-z
Dongwon Choi, Jeehoon Jeon, Tae-Eon Park, Byeong-Kwon Ju, Ki-Young Lee
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Abstract

Two-dimensional (2D) materials are highly sought after for their superior semiconducting properties, making them promising candidates for next-generation electronic and optoelectronic devices. Transition-metal dichalcogenides (TMDCs), such as molybdenum disulfide (MoS2) and tungsten diselenide (WSe2), are promising alternative 2D materials. However, the devices based on these materials experience performance deterioration due to the formation of a Schottky barrier between metal contacts and semiconducting TMDCs. Here, we performed experiments to reduce the Schottky barrier height of MoS2 field-effect transistors (FETs) by lowering the work function (Фm = Evacuum − EF,metal) of the contact metal. We chose polyethylenimine (PEI), a polymer containing simple aliphatic amine groups (–NH2), as a surface modifier of the Au (ФAu = 5.10 eV) contact metal. PEI is a well-known surface modifier that lowers the work function of various conductors such as metals and conducting polymers. Such surface modifiers have thus far been utilized in organic-based devices, including organic light-emitting diodes, organic solar cells, and organic thin-film transistors. In this study, we used the simple PEI coating to tune the work function of the contact electrodes of MoS2 FETs. The proposed method is rapid, easy to implement under ambient conditions, and effectively reduces the Schottky barrier height. We expect this simple and effective method to be widely used in large-area electronics and optoelectronics due to its numerous advantages.

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在接触电极上使用聚合物表面改性剂对二硫化钼场效应晶体管进行肖特基势垒高度工程
二维(2D)材料因其优越的半导体特性而备受追捧,使其成为下一代电子和光电子器件的有希望的候选者。过渡金属二硫化物(TMDCs),如二硫化钼(MoS2)和二硒化钨(WSe2),是有前途的替代二维材料。然而,由于在金属触点和半导体TMDCs之间形成肖特基屏障,基于这些材料的器件的性能会下降。在这里,我们通过降低接触金属的功函数(Фm = evacum−EF,metal)来降低MoS2场效应晶体管(fet)的肖特基势垒高度。我们选择聚乙烯亚胺(PEI),一种含有简单脂肪族胺(-NH2)的聚合物,作为Au (ФAu = 5.10 eV)接触金属的表面改性剂。PEI是一种众所周知的表面改性剂,可以降低各种导体(如金属和导电聚合物)的功函数。迄今为止,这种表面改性剂已用于有机基器件,包括有机发光二极管、有机太阳能电池和有机薄膜晶体管。在本研究中,我们使用简单的PEI涂层来调整MoS2 fet的接触电极的功函数。该方法快速,易于在环境条件下实现,并且有效地降低了肖特基势垒高度。这种简单有效的方法具有诸多优点,可望在大面积电子学和光电子学领域得到广泛应用。
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来源期刊
Nanoscale Research Letters
Nanoscale Research Letters NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
15.00
自引率
0.00%
发文量
110
审稿时长
2.5 months
期刊介绍: Nanoscale Research Letters (NRL) provides an interdisciplinary forum for communication of scientific and technological advances in the creation and use of objects at the nanometer scale. NRL is the first nanotechnology journal from a major publisher to be published with Open Access.
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