EBC machine with large section beam adapted on high speed lines IRELEC “Laminar” concept

Abstract

Secondary emission sources “Laminar Process” allow the extension of the section of the beam in two directions and to control the density of the dose in any place of the beam.

Consequently the dose rate can be modulated and no beam is applied to the support of the window which allows much higher flux and less cooling problems.

This development has pushed us to develop a new type of inerting chamber with low leakage and automatic adaptation to the thickness of the product to be treated.