{"title":"Process and Reliability Sensors for Nanoscale CMOS","authors":"J. Keane, C. Kim, Qunzeng Liu, S. Sapatnekar","doi":"10.1109/MDT.2012.2211561","DOIUrl":null,"url":null,"abstract":"This paper describes the use of sensing schemes that drive on-chip process and aging variation measurements in manufactured silicon.","PeriodicalId":50392,"journal":{"name":"IEEE Design & Test of Computers","volume":"29 1","pages":"8-17"},"PeriodicalIF":0.0000,"publicationDate":"2012-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1109/MDT.2012.2211561","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Design & Test of Computers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MDT.2012.2211561","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
This paper describes the use of sensing schemes that drive on-chip process and aging variation measurements in manufactured silicon.
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