Plasmonic Responses in Metal Nanoslit Array Fabricated by Interference Lithography

IF 2.4 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Journal of Molecular and Engineering Materials Pub Date : 2016-09-01 DOI:10.1142/S2251237316400074
Nan Zhang, Lin Wu, P. Bai, J. Teng, W. Knoll, Xiaodong Zhou
{"title":"Plasmonic Responses in Metal Nanoslit Array Fabricated by Interference Lithography","authors":"Nan Zhang, Lin Wu, P. Bai, J. Teng, W. Knoll, Xiaodong Zhou","doi":"10.1142/S2251237316400074","DOIUrl":null,"url":null,"abstract":"Gap tunable gold nanoslit arrays were fabricated by interference lithography and investigated numerically to understand the impact of fabrication errors on plasmonic responses. To fabricate the gap tunable gold nanoslit arrays, photoresist nanoslit arrays on quartz substrate were first formed by laser interference, and then converted to gold nanoslit array on glass substrate by perpendicular gold deposition and photoresist lift-off. Because the photoresist nanoslit has a sinusoidal profile due to the laser light interference lithography, different photoresist development time from 20s to 30s can tune the photoresist width from 100nm to 70nm, thus allows the gap-width-tuned metallic nanoslits to be attained accordingly. The optical properties of the fabricated gold nanoslit arrays were investigated experimentally and theoretically by studying the absorption in the transmission spectra. Within the wavelength range of 400nm to 860nm, the nanoslit in air has two prominent absorption peaks at 500nm and 670nm. It is found that a simulation model with gold nanoslit fabrication errors such as size variation, chromium adhesive layer and gold residue in nanoslit gaps considered can better match the simulation peaks with the experiments. The simulation of the gold nanoslit array in air indicates that the 500nm peak includes the interband transition and surface plasmon polariton (SPP) at air-gold surface, and the other peak at 670nm is SPP at glass side. The two SPP peaks are both sensitive to the refractive index of surrounding solution, with sensitivities of the two peaks demonstrated to be 267nm/RIU and 111nm/RIU in experiments, and 462nm/RIU and 180nm/RIU by simulation. The lower sensitivity detected by experiments might be due to some air bubbles in the flow cell reducing the effective refractive index around the nanoslit. The shorter wavelength SPP mode is 2.4 (in experiments) or 2.6 times (by simulation) more sensitive than the long wavelength SPP mode because its plasmonic field concentrates on water-gold surface. The plasmonic responses we simulated with fabrication errors explained our experimental investigations, and deepened our understanding on the application of the gold nanoslit array for refractive index-based biosensing.","PeriodicalId":16406,"journal":{"name":"Journal of Molecular and Engineering Materials","volume":"123 1","pages":"1640007"},"PeriodicalIF":2.4000,"publicationDate":"2016-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1142/S2251237316400074","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Molecular and Engineering Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1142/S2251237316400074","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 1

Abstract

Gap tunable gold nanoslit arrays were fabricated by interference lithography and investigated numerically to understand the impact of fabrication errors on plasmonic responses. To fabricate the gap tunable gold nanoslit arrays, photoresist nanoslit arrays on quartz substrate were first formed by laser interference, and then converted to gold nanoslit array on glass substrate by perpendicular gold deposition and photoresist lift-off. Because the photoresist nanoslit has a sinusoidal profile due to the laser light interference lithography, different photoresist development time from 20s to 30s can tune the photoresist width from 100nm to 70nm, thus allows the gap-width-tuned metallic nanoslits to be attained accordingly. The optical properties of the fabricated gold nanoslit arrays were investigated experimentally and theoretically by studying the absorption in the transmission spectra. Within the wavelength range of 400nm to 860nm, the nanoslit in air has two prominent absorption peaks at 500nm and 670nm. It is found that a simulation model with gold nanoslit fabrication errors such as size variation, chromium adhesive layer and gold residue in nanoslit gaps considered can better match the simulation peaks with the experiments. The simulation of the gold nanoslit array in air indicates that the 500nm peak includes the interband transition and surface plasmon polariton (SPP) at air-gold surface, and the other peak at 670nm is SPP at glass side. The two SPP peaks are both sensitive to the refractive index of surrounding solution, with sensitivities of the two peaks demonstrated to be 267nm/RIU and 111nm/RIU in experiments, and 462nm/RIU and 180nm/RIU by simulation. The lower sensitivity detected by experiments might be due to some air bubbles in the flow cell reducing the effective refractive index around the nanoslit. The shorter wavelength SPP mode is 2.4 (in experiments) or 2.6 times (by simulation) more sensitive than the long wavelength SPP mode because its plasmonic field concentrates on water-gold surface. The plasmonic responses we simulated with fabrication errors explained our experimental investigations, and deepened our understanding on the application of the gold nanoslit array for refractive index-based biosensing.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
干涉光刻技术制备金属纳米狭缝阵列的等离子体响应
采用干涉光刻技术制备了间隙可调谐金纳米狭缝阵列,并通过数值模拟研究了制备误差对等离子体响应的影响。为了制备间隙可调金纳米狭缝阵列,首先通过激光干涉在石英衬底上形成光阻剂纳米狭缝阵列,然后通过垂直金沉积和光阻剂剥离将其转化为玻璃衬底上的金纳米狭缝阵列。由于激光干涉光刻导致光刻胶纳米狭缝呈正弦曲线,不同的光刻胶开发时间(20s ~ 30s)可以将光刻胶宽度从100nm调整到70nm,从而可以相应地获得间隙宽度可调的金属纳米狭缝。通过研究透射光谱中的吸收,对制备的金纳米狭缝阵列的光学特性进行了实验和理论研究。在400nm ~ 860nm波长范围内,空气中的纳米狭缝在500nm和670nm处有两个显著的吸收峰。研究发现,考虑金纳米缝尺寸变化、铬粘接层和金残留等制备误差的模拟模型能较好地与实验结果吻合。对空气中金纳米狭缝阵列的模拟表明,500nm处的峰包括空气金表面的带间跃迁和表面等离子激元极化子(SPP), 670nm处的另一个峰是玻璃侧的SPP。两个SPP峰均对周围溶液的折射率敏感,实验结果表明两个峰的灵敏度分别为267nm/RIU和111nm/RIU,仿真结果表明两个峰的灵敏度分别为462nm/RIU和180nm/RIU。实验检测到的低灵敏度可能是由于流动池内的气泡降低了纳米缝周围的有效折射率。短波长的SPP模式由于其等离子体场集中在水金表面,其灵敏度是长波SPP模式的2.4倍(实验结果)或2.6倍(模拟结果)。我们模拟的等离子体响应解释了我们的实验研究,加深了我们对金纳米狭缝阵列在折射率生物传感中的应用的理解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Journal of Molecular and Engineering Materials
Journal of Molecular and Engineering Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-
自引率
0.00%
发文量
13
期刊最新文献
Synthesis of Ribociclib using Phase Transfer Catalysis and Ecofriendly Reducing Agent: Potential Method for Industrial Practice Investigation of DFT calculations and molecular docking studies of 4-aminopyridine 4-aminopyridinium thiocyanate and doxorubicin with 1JPW protein Synthesis, Crystal structure and Characterization of Organic Nonlinear Optical Material Benzophenone for Spectroscopic and Optoelectronics applications Green synthesis of novel acridone fused tetracyclic analogues via microwave promoted fast, solvent-free benzylation and their DFT studies Biological appraisals of Cisplatin and Intercalating Analogies of Nanoscale level Metal (II) Complexes
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1