Dealloying Behavior of NiCo and NiCoCu Thin Films

IF 2.3 Q3 ELECTROCHEMISTRY International journal of electrochemistry Pub Date : 2016-10-13 DOI:10.1155/2016/2935035
Benjamin Peecher, J. R. Hampton
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引用次数: 5

Abstract

Porous metals and alloys, such as those fabricated via electrochemical dealloying, are of interest for a variety of energy applications, ranging from their potential for enhanced catalytic behavior to their use as high surface area supports for pseudocapacitor materials. Here, the electrochemical dealloying process was explored for electrodeposited binary NiCo and ternary NiCoCu thin films. For each of the four different metal ratios, films were dealloyed using linear sweep voltammetry to various potentials in order to gain insight into the evolution of the film over the course of the linear sweep. Electrochemical capacitance, scanning electron microscopy, and energy dispersive X-ray spectroscopy were used to examine the structure and composition of each sample before and after linear sweep voltammetry was performed. For NiCo films, dealloying resulted in almost no change in composition but did result in an increased capacitance, with greater increases occurring at higher linear sweep potentials, indicating the removal of material from the films. Dealloying also resulted in the appearance of large pores on the surface of the high nickel percentage NiCo films, while low nickel percentage NiCo films had little observable change in morphology. For NiCoCu films, Cu was almost completely removed at linear sweep potentials greater than 0.5 V versus Ag/AgCl. The linear sweep removed large Cu-rich dendrites from the films, while also causing increases in measured capacitance.
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NiCo和NiCoCu薄膜的脱合金行为
多孔金属和合金,如通过电化学合金化制备的金属和合金,对各种能源应用都很感兴趣,从它们增强催化行为的潜力到它们用作伪电容器材料的高表面积支撑。本文研究了电沉积二元NiCo和三元NiCoCu薄膜的电化学脱合金工艺。对于四种不同的金属比例,使用线性扫描伏安法对薄膜进行不同电位的合金处理,以便深入了解薄膜在线性扫描过程中的演变。采用线性扫描伏安法前后分别用电化学电容、扫描电镜和能量色散x射线能谱分析各样品的结构和组成。对于NiCo薄膜,合金化几乎没有导致成分的变化,但确实导致了电容的增加,在更高的线性扫描电位下出现了更大的增加,这表明从薄膜中去除了材料。脱合金还导致高镍含量NiCo膜表面出现大孔隙,而低镍含量NiCo膜的形貌变化不大。对于NiCoCu薄膜,与Ag/AgCl相比,在大于0.5 V的线性扫描电位下,Cu几乎完全被去除。线性扫描从薄膜中去除大量富铜枝晶,同时也导致测量电容的增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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2
审稿时长
7 weeks
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