Influence of Air Annealing and Gamma Ray Irradiation on the Optical Properties of Cl16FePc Thin Films

R. Koshy, C. S. Menon
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引用次数: 4

Abstract

Metal phthalocyanines are one of the most promising candidates to be used in the fabrication of such devices. Among various phthalocyanines, Iron Hexadecachloro Phthalocyanine (Cl16FePc) has received less attention. Basic characteristics of Cl16FePc are not reported in literature. Hexadecacholoro phthalocyanines have attracted interest as possible n-type organic semiconductor with high electron mobility and good stability characteristics. In the present work we investigate the optical band gap of the Cl16FePc thin films from the optical absorption spectrum as a function of air annealing temperatures and their suitability for the fabrication of molecular electronic devices. Some optical properties of the samples were studied as a function of γ-radiation doses also. Optical transition is found to be of direct type and optical band gaps are determined by analyzing the absorption spectrum. Vacuum sublimed thin films of Iron hexadecachloro phthalocyanine were prepared at room temperature onto glass substrates at a base pressure of 10-5 Torr on precleaned glass substrates using Hind Hivac 12A4 coating plant. The optical energy band gap Eg were calculated. The mechanism of optical absorption follow the rule of direct transition. In the present paper we also report refractive index, real and imaginary parts of optical dielectric constant etc. from the reflectance measurements.
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空气退火和γ射线辐照对Cl16FePc薄膜光学性能的影响
金属酞菁是最有希望用于制造此类器件的候选者之一。在各种酞菁中,十六氯铁酞菁(Cl16FePc)受到的关注较少。Cl16FePc的基本特性未见文献报道。十六氯酞菁作为一种具有高电子迁移率和良好稳定性的n型有机半导体而受到人们的关注。在本工作中,我们从光吸收光谱研究了Cl16FePc薄膜的光学带隙与空气退火温度的关系及其在分子电子器件制造中的适用性。研究了样品的光学性质随γ辐射剂量的变化规律。光跃迁为直接跃迁,通过分析吸收光谱确定了光带隙。采用Hind Hivac 12A4镀膜设备,在10-5托的基压下,在室温下在玻璃基片上真空升华十六氯酞菁铁薄膜。计算了光能带隙Eg。光吸收机理遵循直接跃迁规律。本文还报道了反射率测量的折射率、光介电常数的实部和虚部等。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
E-journal of Chemistry
E-journal of Chemistry CHEMISTRY, MULTIDISCIPLINARY-
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