Development of Secondary Ion Optical System to Achieve Three-Dimensional Shave-off SIMS

Kohei Matsumura, so-hee Kang, B. Tomiyasu, M. Owari
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Abstract

Secondary ion mass spectrometry (SIMS) has some disadvantages including degradation in depth resolution depending on the depth which are difficult to resolve. To address these disadvantages, we have previously developed shave-off SIMS and achieved two-dimensional mapping. In this study, we designed the appropriate secondary ion optical system by simulation to achieve three-dimensional shave-off SIMS. We developed new optical parts and evaluated the abilities of the designed secondary ion optical system. We acquired the following abilities of the secondary ion optical system: magnification ratio 1.6 × 10, Z-axial resolution 0.70 m, and transmission > 0.1%.
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二次离子光学系统的研制实现三维剃光模拟
二次离子质谱法(SIMS)存在深度分辨率随深度下降、难以分辨等缺点。为了解决这些缺点,我们之前已经开发了剃除SIMS并实现了二维映射。在本研究中,我们通过模拟设计了合适的二次离子光学系统来实现三维剃光SIMS。我们开发了新的光学部件,并对设计的二次离子光学系统的性能进行了评估。我们获得了二次离子光学系统的以下性能:放大倍率1.6 × 10, z轴分辨率0.70m,透射率0.1%。
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