Patterning of Quantum Dots by Dip-Pen and Polymer Pen Nanolithography

IF 3.3 Q3 NANOSCIENCE & NANOTECHNOLOGY Nanofabrication Pub Date : 2015-05-06 DOI:10.1515/nanofab-2015-0002
Soma Biswas, Falko Brinkmann, Michael Hirtz, H. Fuchs
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引用次数: 19

Abstract

Abstract We present a direct way of patterning CdSe/ ZnS quantum dots by dip-pen nanolithography and polymer pen lithography. Mixtures of cholesterol and phospholipid 1,2-dioleoyl-sn-glycero-3 phosphocholine serve as biocompatible carrier inks to facilitate the transfer of quantum dots from the tips to the surface during lithography. While dip-pen nanolithography of quantum dots can be used to achieve higher resolution and smaller pattern features (approximately 1 μm), polymer pen lithography is able to address intermediate pattern scales in the low micrometre range. This allows us to combine the advantages of micro contact printing in large area and massive parallel patterning, with the added flexibility in pattern design inherent in the DPN technique.
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浸笔和聚合物笔纳米光刻的量子点图像化
摘要提出了一种利用浸笔纳米光刻和聚合物笔光刻直接制取CdSe/ ZnS量子点的方法。在光刻过程中,胆固醇和磷脂- 1,2-二油基-sn-甘油-3磷酸胆碱的混合物作为生物相容性载体墨水,促进量子点从尖端转移到表面。虽然量子点的浸笔纳米光刻技术可以实现更高的分辨率和更小的图案特征(大约1 μm),但聚合物笔光刻技术能够解决低微米范围内的中间图案尺度。这使我们能够结合大面积微接触印刷和大规模平行图案的优势,以及DPN技术固有的图案设计灵活性。
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来源期刊
Nanofabrication
Nanofabrication NANOSCIENCE & NANOTECHNOLOGY-
自引率
10.30%
发文量
13
审稿时长
16 weeks
期刊最新文献
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