Yue Shen, Yanting Xu, Jun Gan, Renyao Zhang, M. Wen
{"title":"Effect of Ru targets on the growth and electrical properties of sputtering Ru films","authors":"Yue Shen, Yanting Xu, Jun Gan, Renyao Zhang, M. Wen","doi":"10.1595/205651323x16859589078188","DOIUrl":null,"url":null,"abstract":"Ruthenium (Ru) targets prepared by vacuum hot pressing of Ru powder with different morphologies. Then Ru films were deposited on SiO2/Si(100) substrate for different times by RF magnetron sputtering. The relationship in terms of the microstructure and electrical properties between Ru targets and resultant films at different conditions were studied by means of FESEM, XRD, AFM, four probe and so on. The results showed that parameters of Ru films, such as the average deposition rate, surface roughness, crystallization properties and the growth rate were directly related to the homogeneity of the microstructure of the Ru targets, but there was no correlation between the crystal orientations of the films and the targets. Moreover, the resistivity of Ru films was positively correlated with that of Ru targets.","PeriodicalId":14807,"journal":{"name":"Johnson Matthey Technology Review","volume":"1 1","pages":""},"PeriodicalIF":1.7000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Johnson Matthey Technology Review","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1595/205651323x16859589078188","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Ruthenium (Ru) targets prepared by vacuum hot pressing of Ru powder with different morphologies. Then Ru films were deposited on SiO2/Si(100) substrate for different times by RF magnetron sputtering. The relationship in terms of the microstructure and electrical properties between Ru targets and resultant films at different conditions were studied by means of FESEM, XRD, AFM, four probe and so on. The results showed that parameters of Ru films, such as the average deposition rate, surface roughness, crystallization properties and the growth rate were directly related to the homogeneity of the microstructure of the Ru targets, but there was no correlation between the crystal orientations of the films and the targets. Moreover, the resistivity of Ru films was positively correlated with that of Ru targets.
期刊介绍：
Johnson Matthey Technology Review publishes articles, reviews and short reports on science enabling cleaner air, good health and efficient use of natural resources. Areas of application and fundamental science will be considered in the fields of:Advanced materials[...]Catalysis[...][...]Characterisation[...]Electrochemistry[...]Emissions control[...]Fine and speciality chemicals[...]Historical[...]Industrial processes[...]Materials and metallurgy[...]Modelling[...]PGM and specialist metallurgy[...]Pharmaceutical and medical science[...]Surface chemistry and coatings[...]Sustainable technologies.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
