{"title":"Chemical vapor deposition (CVD) growth of graphene films","authors":"O. Frank, M. Kalbáč","doi":"10.1533/9780857099334.1.27","DOIUrl":null,"url":null,"abstract":"Abstract: The challenges and recent achievements in the chemical vapor deposition (CVD) production of graphene on nickel and copper substrates are reviewed. The formation of large-area monolayer domains, growth on single crystals and controlled formation of ordered multilayers are discussed in detail. Isotopic labeling is introduced as a tool to perform advanced studies on CVD graphene.","PeriodicalId":63892,"journal":{"name":"石墨烯(英文)","volume":"1 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2021-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1533/9780857099334.1.27","citationCount":"13","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"石墨烯(英文)","FirstCategoryId":"1089","ListUrlMain":"https://doi.org/10.1533/9780857099334.1.27","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 13
Abstract
Abstract: The challenges and recent achievements in the chemical vapor deposition (CVD) production of graphene on nickel and copper substrates are reviewed. The formation of large-area monolayer domains, growth on single crystals and controlled formation of ordered multilayers are discussed in detail. Isotopic labeling is introduced as a tool to perform advanced studies on CVD graphene.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
