{"title":"Electrostatic Control and Air Ionization in Cleanrooms for Semiconductor and TFT Production","authors":"G. Wei","doi":"10.17764/JIET.52.1.R38467496M5674P3","DOIUrl":null,"url":null,"abstract":"The most critical manufacturing processes for integrated circuits and thin-film transistors, mainstays of the semiconductor industry, take place in cleanrooms. The strictly controlled temperature and humidity in cleanrooms enable electrostatic charges to be generated and maintained on the surface of objects for an extended time. Electrostatic charge and discharge cause particle contamination, damage to products, and electromagnetic interference, which can lead to production tool lockup. With the development of new manufacturing technologies, products are becoming more sensitive to electrostatic discharge. How to control electrostatic charge and eliminate associated problems has become a challenge in the high-tech semiconductor industry.","PeriodicalId":35935,"journal":{"name":"Journal of the IEST","volume":"52 1","pages":"87-97"},"PeriodicalIF":0.0000,"publicationDate":"2009-04-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of the IEST","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17764/JIET.52.1.R38467496M5674P3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 4
Abstract
The most critical manufacturing processes for integrated circuits and thin-film transistors, mainstays of the semiconductor industry, take place in cleanrooms. The strictly controlled temperature and humidity in cleanrooms enable electrostatic charges to be generated and maintained on the surface of objects for an extended time. Electrostatic charge and discharge cause particle contamination, damage to products, and electromagnetic interference, which can lead to production tool lockup. With the development of new manufacturing technologies, products are becoming more sensitive to electrostatic discharge. How to control electrostatic charge and eliminate associated problems has become a challenge in the high-tech semiconductor industry.
期刊介绍:
The Journal of the IEST is an official publication of the Institute of Environmental Sciences and Technology and is of archival quality and noncommercial in nature. It was established to advance knowledge through technical articles selected by peer review, and has been published for over 50 years as a benefit to IEST members and the technical community at large as as a permanent record of progress in the science and technology of the environmental sciences