Microwave Properties of Bi2223 Thick Films on Ba(Sn, Mg, Ta)O3 Dielectric Disk

A. Oota, Daiki Washimoto, N. Kato, Y. Kintaka
{"title":"Microwave Properties of Bi2223 Thick Films on Ba(Sn, Mg, Ta)O3 Dielectric Disk","authors":"A. Oota, Daiki Washimoto, N. Kato, Y. Kintaka","doi":"10.2221/JCSJ.37.157","DOIUrl":null,"url":null,"abstract":"We fabricated 2.1GHz TM010-mode microwave resonators with (Bi, Pb)2Sr2Ca2Cu3Ox (Bi2223) superconducting thick films on a Ba(Sn, Mg, Ta)O3 dielectric disk with a relative dielectric constant of er=24. The Bi2223 thick films were screen-printed on both sides of the dielectric disk and subjected to a double repetition of cold isostatic pressing at 0.4GPa and sintering at various temperatures ranging from 820 to 840°C. An increase of the sintering temperature raises the Bi2223 phase purity up to 98% on the surfaces of the thick films, but high-temperature sintering above 830°C causes a chemical reaction at the interface between the Bi2223 thick film and the dielectric disk. An optimization of the sintering temperature to 830°C gives the unloaded quality factors Qu as much as 74, 000 at 70K and 158, 000 at 25K, which correspond to surface resistances Rs of 0.34 and 0.15mΩ for Bi2223 thick films, respectively. These values are approximately 20 times higher than those for the resonator using Ag electrodes with the same structure.","PeriodicalId":93144,"journal":{"name":"Teion kogaku = Cryogenic engineering : [official journal of the Cryogenic Association of Japan]","volume":"37 1","pages":"157-161"},"PeriodicalIF":0.0000,"publicationDate":"2002-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Teion kogaku = Cryogenic engineering : [official journal of the Cryogenic Association of Japan]","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2221/JCSJ.37.157","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

We fabricated 2.1GHz TM010-mode microwave resonators with (Bi, Pb)2Sr2Ca2Cu3Ox (Bi2223) superconducting thick films on a Ba(Sn, Mg, Ta)O3 dielectric disk with a relative dielectric constant of er=24. The Bi2223 thick films were screen-printed on both sides of the dielectric disk and subjected to a double repetition of cold isostatic pressing at 0.4GPa and sintering at various temperatures ranging from 820 to 840°C. An increase of the sintering temperature raises the Bi2223 phase purity up to 98% on the surfaces of the thick films, but high-temperature sintering above 830°C causes a chemical reaction at the interface between the Bi2223 thick film and the dielectric disk. An optimization of the sintering temperature to 830°C gives the unloaded quality factors Qu as much as 74, 000 at 70K and 158, 000 at 25K, which correspond to surface resistances Rs of 0.34 and 0.15mΩ for Bi2223 thick films, respectively. These values are approximately 20 times higher than those for the resonator using Ag electrodes with the same structure.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Ba(Sn, Mg, Ta)O3介质盘上Bi2223厚膜的微波特性
采用(Bi, Pb)2Sr2Ca2Cu3Ox (Bi2223)超导厚膜,在相对介电常数为er=24的Ba(Sn, Mg, Ta)O3介质盘上制备了2.1GHz tm010模式微波谐振器。在介质盘两侧丝网印刷Bi2223厚膜,在0.4GPa下进行冷等静压,并在820 ~ 840℃的不同温度下进行两次重复烧结。升高烧结温度可使厚膜表面的Bi2223相纯度达到98%,但高于830℃的高温烧结会在Bi2223厚膜与介电盘的界面处发生化学反应。将烧结温度优化到830°C,在70K和25K下,卸载质量因子Qu分别高达74,000和158,000,对应于Bi2223厚膜的表面电阻Rs分别为0.34和0.15mΩ。这些值比使用相同结构的银电极的谐振器高约20倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
特集「最先端分野で活躍する超伝導エレクトロニクス技術」に寄せて Superconducting Sensing Technology Corporation (SUSTEC) Development of Superconductors for Fusion Reactors in the Superconducting Magnet System Laboratory, National Institute for Fusion Science Precision Measurement Techniques of Thermophysical Properties 特集「低温域における精密計測技術」に寄せて
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1