{"title":"Nitridation-Etch of Silicon Oxide in Fluorocarbon/Nitrogen Plasma: A Computational Study","authors":"Du Zhang, Yu-Hao Tsai, Hojin Kim, Mingmei Wang","doi":"10.33079/JOMM.19020103","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":66020,"journal":{"name":"微电子制造学报","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2019-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"微电子制造学报","FirstCategoryId":"1089","ListUrlMain":"https://doi.org/10.33079/JOMM.19020103","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}