{"title":"[Paper] Formation of Microscopic Polymer Structure in LCs by Patterned UV Irradiation using Polymerization Inhibitor","authors":"T. Ishinabe, S. Matsuoka, Y. Shibata, H. Fujikake","doi":"10.3169/mta.8.196","DOIUrl":null,"url":null,"abstract":"We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.","PeriodicalId":41874,"journal":{"name":"ITE Transactions on Media Technology and Applications","volume":"29 1","pages":""},"PeriodicalIF":0.5000,"publicationDate":"2020-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ITE Transactions on Media Technology and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3169/mta.8.196","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
We controlled the fine-pitch polymer aggregation in liquid crystals (LCs) two-dimensionally via patterned ultraviolet (UV) irradiation, where a photomask was used to precisely control the light distribution. The combination of high-intensity UV light and a polymerization inhibitor suppressed polymerization in the masked area, and improved the uniformity of LC alignment between fine-pitch polymer structures. We were able to electrically control the diffraction patterns of polymer-dispersed LCs.