[Paper] High Temperature Tolerant Barrier Films with Stacking Barrier Layers by Sputtering and ALD

IF 0.5 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC ITE Transactions on Media Technology and Applications Pub Date : 2021-01-01 DOI:10.3169/mta.9.216

Toshinao Yuki, T. Nishikawa, Miho Sugimoto, Hitoshi Nakada, M. Koden

引用次数: 1

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[论文]溅射与ALD叠合的耐高温势垒薄膜

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ITE Transactions on Media Technology and Applications ENGINEERING, ELECTRICAL & ELECTRONIC-

CiteScore

1.70

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0.00%

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期刊介绍：・Multimedia systems and applications ・Multimedia analysis and processing ・Universal services ・Advanced broadcasting media ・Broadcasting network technology ・Contents production ・CG and multimedia representation ・Consumer Electronics ・3D imaging technology ・Human Information ・Image sensing ・Information display ・Multimedia Storage ・Others.

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