Bulk Etch Rate of LR 115 Polymeric Radon Detector

D. S. Agba, K. Djagouri, B. L. Gogon, A. A. Koua
{"title":"Bulk Etch Rate of LR 115 Polymeric Radon Detector","authors":"D. S. Agba, K. Djagouri, B. L. Gogon, A. A. Koua","doi":"10.4236/DETECTION.2021.81001","DOIUrl":null,"url":null,"abstract":"In this study, we used strippable LR 115 type 2 which is a Solid State Nuclear Track Detector (SSNTD) widely known for radon gas detection and measurement. The removed thickness of the active layer of samples of this SSNTD, were determined by measuring the average initial thickness (before etching) and residual thickness after 80 to 135 minutes chemical etching in the standard conditions, using an electronic comparator. These results allowed the calculation of the bulk etch rate of this detector in a simple way. The mean value obtained is (3.21 ± 0.21) μm/h. This value is in close agreement with those reported by different authors. It is an important parameter for alpha track counting on the sensitive surface of this polymeric detector after chemical etching because track density depends extremely on its removed layer. This SSNTD was then used for environmental radon gas monitoring in Côte d’Ivoire.","PeriodicalId":68695,"journal":{"name":"检测(英文)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2021-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"检测(英文)","FirstCategoryId":"3","ListUrlMain":"https://doi.org/10.4236/DETECTION.2021.81001","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this study, we used strippable LR 115 type 2 which is a Solid State Nuclear Track Detector (SSNTD) widely known for radon gas detection and measurement. The removed thickness of the active layer of samples of this SSNTD, were determined by measuring the average initial thickness (before etching) and residual thickness after 80 to 135 minutes chemical etching in the standard conditions, using an electronic comparator. These results allowed the calculation of the bulk etch rate of this detector in a simple way. The mean value obtained is (3.21 ± 0.21) μm/h. This value is in close agreement with those reported by different authors. It is an important parameter for alpha track counting on the sensitive surface of this polymeric detector after chemical etching because track density depends extremely on its removed layer. This SSNTD was then used for environmental radon gas monitoring in Côte d’Ivoire.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
ll115型聚合物氡探测器的整体蚀刻速率
在这项研究中,我们使用了可剥离的LR 115型2,这是一种固体核径迹探测器(SSNTD),广泛用于氡气的检测和测量。通过测量标准条件下化学腐蚀前的平均初始厚度和化学腐蚀80 ~ 135分钟后的残余厚度,利用电子比较器确定该SSNTD样品活性层的去除厚度。这些结果允许以一种简单的方式计算该探测器的整体蚀刻速率。平均值为(3.21±0.21)μm/h。这个值与其他作者报告的值非常一致。化学蚀刻后,该聚合物探测器敏感表面的径迹密度与被去除的层密切相关,因此径迹密度是进行径迹计数的重要参数。该SSNTD随后被用于Côte科特迪瓦的环境氡气监测。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
20 ppm Anhydrous Ammonia Odor Agent Proposed for Hydrogen Fuel for Safe Detection of Leaks Comparative Alpha Tracks Counting Using an Optical Microscope and a Spark Counter The Measurement and Evaluation of the Electromagnetic Environment from 5G Base Station Monitoring and Evaluation of Air Pollution at Ohaji/Egbema Flow Station and Its Environs via GPS in Ohaji Egbema Lga, Imo State Nigeria Direct Conversion X-Ray Detectors with High Sensitivity at Low Dose Rate Based on All-Inorganic Lead-Free Perovskite Wafers
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1