Technology of Porous Tantalum Production

Y. Tuleushev, V. Volodin, Е. А. Zhakanbaev, V. Lisitsin, A. Migunova, A. Suleymenova
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引用次数: 0

Abstract

Ion-plasma sputtering and codeposition of ultrafine Ta and Cd particles on a moving substrate were used to prepare the solid solutions, in particular, the alloys with up to 66.2 at.% Cd in the form of coatings. In vacuum heat treatment cadmium evaporates at 700°C from cadmium based solid solutions resulting in formation of a porous tantalum with a highly developed surface. The prepared tantalum-based materials assume the technological application of the investigation results.
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多孔钽生产技术
采用离子等离子溅射和超细Ta和Cd颗粒在移动衬底上共沉积的方法制备了固溶体,特别是制备了高达66.2 at的合金。% Cd以涂层的形式存在。在真空热处理中,镉在700°c时从镉基固溶体中蒸发,形成具有高度发达表面的多孔钽。制备的钽基材料承担了研究成果的技术应用。
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