M. Yoon, H. Yeom, Jong-Ryul Jeong, Jung Hyung Kim, Hyo-Chang Lee
{"title":"Brief Review of Atomic Layer Etching Based on Radiofrequency-Biased Ar/C4F6-Mixture-Based Inductively Coupled Plasma Characteristics","authors":"M. Yoon, H. Yeom, Jong-Ryul Jeong, Jung Hyung Kim, Hyo-Chang Lee","doi":"10.5757/asct.2023.32.2.34","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":8223,"journal":{"name":"Applied Science and Convergence Technology","volume":null,"pages":null},"PeriodicalIF":1.2000,"publicationDate":"2023-03-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Science and Convergence Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.5757/asct.2023.32.2.34","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}