Investigating failure mechanisms in high-power microwave frequency selective surfaces

Chien‐Hao Liu, J. Booske, N. Behdad
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引用次数: 2

Abstract

When operated in high-power pulsed systems, frequency selective surfaces (FSS) are susceptible to breakdown. Breakdown in these devices changes the frequency response of the device and can result in permanent damage in certain situations. Recently, it has been demonstrated that breakdown induced at a certain location in an FSS can result in breakdown at other locations (e.g. neighboring unit cells) where the intensity of the incident EM wave is not high enough to cause breakdown under normal circumstances. In this paper, we examine the physical cause of this phenomenon and demonstrate that this is caused by the generation of vacuum ultraviolet (VUV) radiation, at the location of the initial discharge, which facilitates breakdown at other locations. Furthermore, through a series of experimental studies, we identify the distances over which this VUV radiation has a high enough intensity to facilitate breakdown at the neighboring unit cells. The results presented in this paper are expected to be useful in mitigating and localizing the adverse impacts of breakdown in HPM FSSs covering large aperture dimensions or in designing devices that generate large scale breakdown (e.g. periodic plasmas).
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研究高功率微波频率选择表面的失效机制
当在大功率脉冲系统中工作时,频率选择表面(FSS)容易被击穿。这些设备的故障会改变设备的频率响应,在某些情况下可能导致永久性损坏。最近,有研究表明,在FSS中某一位置引起的击穿可能导致入射电磁波强度在正常情况下不足以引起击穿的其他位置(例如相邻的单元格)击穿。在本文中,我们研究了这一现象的物理原因,并证明这是由真空紫外线(VUV)辐射的产生引起的,在初始放电的位置,这有助于在其他位置击穿。此外,通过一系列的实验研究,我们确定了该VUV辐射具有足够高的强度以促进相邻单元细胞击穿的距离。本文提出的结果有望用于减轻和定位覆盖大孔径尺寸的HPM fss击穿的不利影响,或用于设计产生大规模击穿的设备(例如周期性等离子体)。
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